逐层集成光学对准尺的设计与数值研究

Aiham Adawi, H. Jiang, B. Kaminska
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摘要

等离子体结构的研究引起了极大的关注,因为这些结构可以被设计成一种独特的方式来操纵光。它们允许入射辐射与结构金属表面上的表面电子耦合。这种耦合已被用于各种应用,包括结构着色、成像、传感和安全。在本研究中,提出并设计了一种基于等离子体结构的电位对准技术,该技术结合纳米光学技术,可用于3D集成电路技术中器件层的垂直集成,以提高性能,同时保持小尺寸。这些结构被放置在需要集成的层上。采用TE(横电)和TM(横磁)模式实现精确的集成和对准:光阻挡模式和光阻挡与等离子体模式。在挡光模式下,入射光为s偏振光,用于引导水平对准,其中光强变化对微小的纳米物理位移非常敏感。在另一种模式下,考虑到表面等离子激元的激发,入射光是p偏振的,并用于引导观察到光透射峰的完全对准。为了验证这些模式,本文采用模拟方法进行了数值研究。
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Design and Numerical Studies of Optical Alignment Rulers for Layer-by-Layer Integration
Plasmonics structures have gained great attention by research since these structures could be engineered to manipulate light into a unique fashion. They allow the coupling of the incident radiation with the surface electrons on the metal surface of the structure. This coupling has been utilized in a variety of applications including structural coloring, imaging, sensing, and security. In this research, a study of a potential alignment technique based on a plasmonic structure is proposed and designed by incorporating nano-optical technology for possible uses in vertical integration of device layers in 3D ICs technology to boost the performance while maintaining small form factor. The structures are positioned onto the layers that need to be integrated. TE (Transverse Electric) and TM (Transverse Magnetic) modes are used to achieve the accurate integration and alignment: light blocking mode only and light blocking with plasmonics mode. In the light blocking mode, incident light is s-polarized and is used to guide the horizontal alignment where light intensity changes are very sensitive to the small nano physical shifts. In the other mode, with consideration of surface plasmon excitation, incident light is p-polarized and is used to guide the complete alignment where light transmission peaks are observed. To validate these modes, numerical studies are carried using simulations and presented here.
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