1.5 /spl mu/m GaInNAsSb/GaAs激光器中载流子泄漏的作用及抑制

S. Bank, M. Wistey, H. Yuen, L. Goddard, J. Harris
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引用次数: 1

摘要

最近,第一个室温、连续波(CW)、1.49 /spl mu/m的gaas基激光器被证实。在这些装置中,注入效率/spl eta//sub inj/相当低,/spl sim/45%。确定低/spl //sub //的来源可以进一步改善器件性能。低/spl δ //子注入的原因是载流子泄漏和非辐射复合。在本文中,提出了几种技术来减少这种缺陷增强的电子泄漏机制,包括一种新的不对称量子阱结构。
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The role and suppression of carrier leakage in 1.5 /spl mu/m GaInNAsSb/GaAs lasers
Recently, the first room temperature, continuous wave (CW), 1.49 /spl mu/m GaAs-based lasers were demonstrated. The injection efficiency, /spl eta//sub inj/, was quite low in these devices, /spl sim/45%. Determining the origin of the low /spl eta//sub inj/ allows further improvements in device performance. The origin of the low /spl eta//sub inj/ is due to carrier leakage and nonradiative recombination. In this paper, several techniques are proposed to reduce this defect-enhanced electron leakage mechanism, including a novel asymmetric quantum well structure.
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