基于0.1µm GaAs pHEMT工艺的2.3 db NF的23 - 43ghz LNA

Leyang Huang, Zekun Li, Zuojun Wang, Peigen Zhou, Jixin Chen
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引用次数: 0

摘要

本文提出了一种用于5G通信的0.1µm GaAs pHEMT工艺的超宽带低噪声放大器(LNA)。为了保证在宽工作频带内的无条件稳定,采用了源退化电感。得益于输入和级内匹配网络、源退化和宽带设计技术,LNA实现了2-2.4 dB的实测噪声系数(NF),高于21 dB的小信号增益,以及在23 GHz至43 GHz范围内-16 dBm至-10 dBm的输入1db压缩点(IP-1dB)。总功耗为118.4 mW,芯片面积为2.4 × 1.3mm2。
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A 23–43 GHz LNA with 2.3-dB NF in 0.1µm GaAs pHEMT Process
This paper presents an ultra-wideband low noise amplifier (LNA) fabricated in 0.1µm GaAs pHEMT process for 5G communication application. In order to ensure unconditional stability in the wide operation frequency band, source degeneration inductances are adopted. Benefited from input and inner-stage matching networks, source degeneration and wideband design techniques, the LNA achieves a measured noise figure (NF) of 2-2.4 dB, a small signal gain higher than 21 dB, and an input 1 dB compression point (IP-1dB) of -16 dBm to -10 dBm from 23 GHz to 43 GHz. The total power consumption is 118.4 mW, and the chip area is 2.4 × 1.3mm2.
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