点场发射极电子束的磁聚焦

Paweł Urbański, P. Szyszka, T. Grzebyk
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引用次数: 0

摘要

本文提出了一种MEMS电子微柱的结构,该电子微柱的场发射极以硅尖覆盖碳纳米管层的形式存在。虽然它保证了高的电子电流,但它的焦点光斑和均匀性远非最佳。因此,为了改善电子束的参数,作者提出了采用磁聚焦的方法。垂直磁场是由放置在阴极下方的强力钕磁铁产生的。它将电子限制在光轴附近,防止它们扩散。实验证明,可以获得直径小于1mm的小而均匀的电子束光斑。与仅使用电子光学系统相比,磁聚焦结合电子光学系统显著提高了光束质量。此外,在阳极处获得了令人满意的电流水平。当UA = 2.5 kV, UG = 1.5 kV, UF = 1.4 kV时,外加磁聚焦,阴极上的电流高达16µA,发射阴极与阳极的距离为9.6 mm。
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Magnetic Focusing of an Electron Beam from a Point Field Emitter
This article presents a construction of a MEMS electron microcolumn with a field emitter in a form of a silicon tip covered with a carbon nanotube layer. Although it ensures high electron current, its focal spot and uniformity is far from optimal. Therefore, to improve the parameters of the electron beam authors proposed to use magnetic focusing. The perpendicular magnetic field is generated by a strong neodymium magnet placed below the cathode. It confines the electrons near the optical axis and prevents them from spreading. The tests proved that it is possible to obtain a small, homogeneous electron beam spot with a diameter lower than 1 mm. Magnetic focusing combined with electron optics significantly improved the quality of the beam, in comparison to the system with only electron optics. In addition, a satisfactory level of current was achieved at the anode. For UA = 2.5 kV, UG = 1.5 kV and UF = 1.4 kV, with additional magnetic focus, the current on the anode was as high as 16 µA, with the distance between the emission cathode and the anode equal to 9.6 mm.
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