n掺杂对优化富锗材料相变存储器的影响

G. Navarro, V. Sousa, P. Noé, N. Castellani, M. Coue, J. Kluge, A. Kiouseloglou, C. Sabbione, A. Persico, A. Roule, O. Cueto, S. Blonkowski, F. Fillot, N. Bernier, R. Annunziata, M. Borghi, E. Palumbo, P. Zuliani, L. Perniola
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引用次数: 10

摘要

本文研究了优化后的富锗材料中N掺杂对器件编程和存储性能的影响。我们将这些合金集成到最先进的相变存储器(PCM)电池中,并分析了n掺杂和未掺杂存储电池中SET操作的效率,比较了基于电压的编程和基于电流的编程。这方面通过电学表征、物理化学分析和电热模拟进行了广泛的研究。最终评估了这些器件的热稳定性,并授予高温数据保留,使PCM能够用于嵌入式应用。
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N-Doping Impact in Optimized Ge-Rich Materials Based Phase-Change Memory
In this paper we investigate the impact of N- doping in optimized Ge-rich Ge2Sb2Te5 materials on device programming and storing performance. We integrate these alloys in state-of-the-art Phase- Change Memory (PCM) cells and we analyze the efficiency of the SET operation in N-doped and undoped memory cells, comparing voltage based programming with current based programming. This aspect is extensively investigated through electrical characterization, physico-chemical analysis and electro-thermal simulations. The thermal stability of these devices is finally evaluated and high temperature data retention is granted enabling PCM for embedded applications.
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