用Ga-Sn-O薄膜制备两层ReRAM

Ayata Kurasaki, Sumio Sugiski, R. Tanaka, T. Matsuda, M. Kimura
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摘要

本文研究了采用Ga-Sn-O (GTO)薄膜的电阻式随机存取存储器(ReRAM)。本研究制作的器件具有夹层结构,在电极之间夹有两层不同电阻值的GTO薄膜。从所制备器件的电流-电压特性来看,即使重复写入和擦除400次,也可以确认其作为存储器的功能。
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Development of two-layered ReRAM using Ga-Sn-O thin film
We have studied Resistive Random Access Memory (ReRAM) using Ga-Sn-O (GTO) thin film. The device fabricated in this study has a sandwich structure in which two layers of GTO thin films with different resistance values are sandwiched between electrodes. From the current-voltage characteristics of the fabricated device, it was possible to confirm the function as memory even if writing and erasing are repeated 400 times.
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