STT-MRAM的最新技术见解:结构、材料和工艺集成

Jeong-Hun Choe
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摘要

STT-MRAM、PCRAM、ReRAM、FeRAM和XPoint memory等新兴内存产品已经在市场上成功商业化了十多年,特别是在DDR、SCM(存储级内存)和嵌入式缓存应用方面。其中,STT-MRAM技术目前正在取代eSRAM、eFLASH和eDRAM作为高速缓存。半导体代工厂和idm更关注独立类型或嵌入式设备的MRAM。他们正在开发、生产和缩小MRAM电池设计到22纳米以上。此外,MTJ结构由于采用了合成反铁磁、铁磁等多层材料,甚至采用了双隧道势垒结构,并在结构中加入了多层扩散势垒、间隔层和耦合层,使其具有较高的性能和结构稳定性。我们回顾和讨论了最新的STTMRAM产品的结构、材料、设计和工艺技术,以及面临的挑战。
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Recent Technology Insights on STT-MRAM: Structure, Materials, and Process Integration
Emerging memory products such as STT-MRAM, PCRAM, ReRAM, FeRAM, and XPoint Memory have been successfully commercialized on market for more than a decade, especially for DDR, SCM (storage-class memory), and embedded cache applications. Among them, STT-MRAM technology is now popular for cache memory replacing eSRAM, eFLASH, and eDRAM. Semiconductor foundries and IDMs are focusing more on MRAM with stand-alone type or embedded devices. They’re developing, producing, and scaling down the MRAM cell design to 22 nm and beyond. Further, the MTJ structure is quite complicated and complex due to multilayers such as synthetic antiferro-magnetics, ferromagnetic, and even they use a dual tunnel barrier structure, and multi-layered diffusion barriers, spacers, and coupling layers added into the structure for high performance and structural stability. We review and discuss the structure, materials, design, and process technology of STTMRAM products up to date, and challenges as well.
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