{"title":"氧化阱纳米线场效应管中电位波动引起电流噪声的数值模拟","authors":"Yuki Furubayashi, M. Ogawa, S. Souma","doi":"10.1109/SISPAD.2014.6931598","DOIUrl":null,"url":null,"abstract":"We present a theoretical study on the temporal current fluctuation in nanowire FET caused by the presence of a single gate oxide trap through the Coulomb interaction. Our calculations based on the scattering theoretical formulation of the current noise showed that the presence of the trap level in the gate insulator gives rise to the enhancement of the noise at a specific gate voltage. The peak position of the noise is related to the capacitive coupling strengths of the trap to the channel and the gate electrode, suggesting that the current noise can be used to measure such physical quantities.","PeriodicalId":101858,"journal":{"name":"2014 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","volume":"421 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-10-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Numerical simulation of current noise caused by potential fluctuation in nanowire FET with an oxide trap\",\"authors\":\"Yuki Furubayashi, M. Ogawa, S. Souma\",\"doi\":\"10.1109/SISPAD.2014.6931598\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We present a theoretical study on the temporal current fluctuation in nanowire FET caused by the presence of a single gate oxide trap through the Coulomb interaction. Our calculations based on the scattering theoretical formulation of the current noise showed that the presence of the trap level in the gate insulator gives rise to the enhancement of the noise at a specific gate voltage. The peak position of the noise is related to the capacitive coupling strengths of the trap to the channel and the gate electrode, suggesting that the current noise can be used to measure such physical quantities.\",\"PeriodicalId\":101858,\"journal\":{\"name\":\"2014 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)\",\"volume\":\"421 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-10-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2014 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SISPAD.2014.6931598\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SISPAD.2014.6931598","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Numerical simulation of current noise caused by potential fluctuation in nanowire FET with an oxide trap
We present a theoretical study on the temporal current fluctuation in nanowire FET caused by the presence of a single gate oxide trap through the Coulomb interaction. Our calculations based on the scattering theoretical formulation of the current noise showed that the presence of the trap level in the gate insulator gives rise to the enhancement of the noise at a specific gate voltage. The peak position of the noise is related to the capacitive coupling strengths of the trap to the channel and the gate electrode, suggesting that the current noise can be used to measure such physical quantities.