未掺杂DG mosfet的亚阈值行为

F. J. Garcla-Satnchez, A. Ortiz-Conde, J. Muci
{"title":"未掺杂DG mosfet的亚阈值行为","authors":"F. J. Garcla-Satnchez, A. Ortiz-Conde, J. Muci","doi":"10.1109/EDSSC.2005.1635210","DOIUrl":null,"url":null,"abstract":"Undoped-body MOSFETs display peculiar semiconductor body thickness dependent subthreshold regions. The very concept of threshold voltage in undoped-body devices is affected by the interpretation given to this behavior. The fundamental subthreshold behavior is examined here from the point of view of its extension and slope factor. Its dependence on technological parameters is analyzed in light of phenomenological considerations. It is found that the subthreshold region may potentially exhibit two coexisting subregions with ideal slope factors of 60 and 120 mV/dec.","PeriodicalId":429314,"journal":{"name":"2005 IEEE Conference on Electron Devices and Solid-State Circuits","volume":"216 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"10","resultStr":"{\"title\":\"Subthreshold Behavior of Undoped DG MOSFETs\",\"authors\":\"F. J. Garcla-Satnchez, A. Ortiz-Conde, J. Muci\",\"doi\":\"10.1109/EDSSC.2005.1635210\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Undoped-body MOSFETs display peculiar semiconductor body thickness dependent subthreshold regions. The very concept of threshold voltage in undoped-body devices is affected by the interpretation given to this behavior. The fundamental subthreshold behavior is examined here from the point of view of its extension and slope factor. Its dependence on technological parameters is analyzed in light of phenomenological considerations. It is found that the subthreshold region may potentially exhibit two coexisting subregions with ideal slope factors of 60 and 120 mV/dec.\",\"PeriodicalId\":429314,\"journal\":{\"name\":\"2005 IEEE Conference on Electron Devices and Solid-State Circuits\",\"volume\":\"216 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-12-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"10\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2005 IEEE Conference on Electron Devices and Solid-State Circuits\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/EDSSC.2005.1635210\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2005 IEEE Conference on Electron Devices and Solid-State Circuits","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EDSSC.2005.1635210","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 10

摘要

非掺杂体mosfet显示特殊的半导体体厚度相关的亚阈值区域。在非掺杂体器件中阈值电压的概念受到对这种行为的解释的影响。本文从其延伸性和斜率因子的角度考察了基本的阈下行为。从现象学的角度分析了其对工艺参数的依赖性。发现阈下区域可能存在两个共存的子区域,理想斜率因子为60和120 mV/dec。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Subthreshold Behavior of Undoped DG MOSFETs
Undoped-body MOSFETs display peculiar semiconductor body thickness dependent subthreshold regions. The very concept of threshold voltage in undoped-body devices is affected by the interpretation given to this behavior. The fundamental subthreshold behavior is examined here from the point of view of its extension and slope factor. Its dependence on technological parameters is analyzed in light of phenomenological considerations. It is found that the subthreshold region may potentially exhibit two coexisting subregions with ideal slope factors of 60 and 120 mV/dec.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Low-voltage embedded RAMs in the nanometer era Design of a Fully Differential Gain-Boosted Folded-Cascode Op Amp with Settling Performance Optimization Technology Platform Based On Comprehensive Device Modeling For RF SoC Design A Simple Model for Channel Noise of Deep Submicron MOSFETs A Low Power CMOS Full-Band UWB Power Amplifier Using Wideband RLC Matching Method
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1