{"title":"同时状态,Vt和Tox分配以使总备用功率最小化","authors":"Dongwook Lee, H. Singh, D. Blaauw, D. Sylvester","doi":"10.1109/DATE.2004.1268894","DOIUrl":null,"url":null,"abstract":"Standby leakage current minimization is a pressing concern for mobile applications that rely on standby modes to extend battery life. Also, gate oxide leakage current (I/sub gate/) has become comparable to subthreshold leakage (I/sub sub/) in 90 nm technologies. In this paper, we propose a new method that uses a combined approach of sleep-state, threshold voltage (V/sub t/ and gate oxide thickness (T/sub ox/) assignments in a dual-V/sub t/ and dual-T/sub ox/ process to minimize both I/sub sub/ and I/sub gate/. Using this method, total leakage current can be dramatically reduced since in a known state in standby mode, only certain transistors are responsible for leakage current and need to be considered for high-V/sub t/ or thick-T/sub ox/ assignment. We formulate the optimization problem for simultaneous state, V/sub t/ and T/sub ox/ assignments under delay constraints and propose two practical heuristics. We implemented and tested the proposed methods on a set of synthesized benchmark circuits. Results show an average leakage current reduction of 5a-6X and 2-3X compared to previous approaches that only use state or state+V/sub t/ assignment, respectively, with small delay penalties.","PeriodicalId":335658,"journal":{"name":"Proceedings Design, Automation and Test in Europe Conference and Exhibition","volume":"78 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-02-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"27","resultStr":"{\"title\":\"Simultaneous state, Vt and Tox assignment for total standby power minimization\",\"authors\":\"Dongwook Lee, H. Singh, D. Blaauw, D. Sylvester\",\"doi\":\"10.1109/DATE.2004.1268894\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Standby leakage current minimization is a pressing concern for mobile applications that rely on standby modes to extend battery life. Also, gate oxide leakage current (I/sub gate/) has become comparable to subthreshold leakage (I/sub sub/) in 90 nm technologies. In this paper, we propose a new method that uses a combined approach of sleep-state, threshold voltage (V/sub t/ and gate oxide thickness (T/sub ox/) assignments in a dual-V/sub t/ and dual-T/sub ox/ process to minimize both I/sub sub/ and I/sub gate/. Using this method, total leakage current can be dramatically reduced since in a known state in standby mode, only certain transistors are responsible for leakage current and need to be considered for high-V/sub t/ or thick-T/sub ox/ assignment. We formulate the optimization problem for simultaneous state, V/sub t/ and T/sub ox/ assignments under delay constraints and propose two practical heuristics. We implemented and tested the proposed methods on a set of synthesized benchmark circuits. Results show an average leakage current reduction of 5a-6X and 2-3X compared to previous approaches that only use state or state+V/sub t/ assignment, respectively, with small delay penalties.\",\"PeriodicalId\":335658,\"journal\":{\"name\":\"Proceedings Design, Automation and Test in Europe Conference and Exhibition\",\"volume\":\"78 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2004-02-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"27\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings Design, Automation and Test in Europe Conference and Exhibition\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DATE.2004.1268894\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings Design, Automation and Test in Europe Conference and Exhibition","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DATE.2004.1268894","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 27
摘要
对于依赖待机模式来延长电池寿命的移动应用程序来说,最小化待机漏电流是一个迫切需要关注的问题。此外,栅极氧化物泄漏电流(I/sub gate/)已经可以与90纳米技术中的亚阈值泄漏电流(I/sub sub/)相媲美。在本文中,我们提出了一种新的方法,该方法在双V/sub /和双t/ sub/过程中使用睡眠状态,阈值电压(V/sub t/)和栅极氧化厚度(t/ sub ox/)分配的组合方法来最小化I/sub /和I/sub门/。使用这种方法,总泄漏电流可以显著降低,因为在待机模式的已知状态下,只有某些晶体管负责泄漏电流,需要考虑高v /sub t/或厚t/ sub ox/分配。提出了延迟约束下同步状态V/下标t/和t/下标x/分配的优化问题,并提出了两种实用的启发式方法。我们在一组合成基准电路上实现并测试了所提出的方法。结果显示,与之前仅使用state或state+V/sub / assignment的方法相比,平均泄漏电流减少了5a-6X和2-3X,并且延迟惩罚很小。
Simultaneous state, Vt and Tox assignment for total standby power minimization
Standby leakage current minimization is a pressing concern for mobile applications that rely on standby modes to extend battery life. Also, gate oxide leakage current (I/sub gate/) has become comparable to subthreshold leakage (I/sub sub/) in 90 nm technologies. In this paper, we propose a new method that uses a combined approach of sleep-state, threshold voltage (V/sub t/ and gate oxide thickness (T/sub ox/) assignments in a dual-V/sub t/ and dual-T/sub ox/ process to minimize both I/sub sub/ and I/sub gate/. Using this method, total leakage current can be dramatically reduced since in a known state in standby mode, only certain transistors are responsible for leakage current and need to be considered for high-V/sub t/ or thick-T/sub ox/ assignment. We formulate the optimization problem for simultaneous state, V/sub t/ and T/sub ox/ assignments under delay constraints and propose two practical heuristics. We implemented and tested the proposed methods on a set of synthesized benchmark circuits. Results show an average leakage current reduction of 5a-6X and 2-3X compared to previous approaches that only use state or state+V/sub t/ assignment, respectively, with small delay penalties.