Raman spectroscopy of Mg-doped gallium nitride: shift of the A/sub 1/(LO) phonon

For the development of improved devices, the control and understanding of the electrical properties of nitride semiconductors is essential. Although significant progress has been made in recent years, the p-type doping of nitride semiconductors has proven to be challenging. It has been found necessary to anneal the sample after growth at moderate (700/spl deg/C-900/spl deg/C) temperatures in order to electrically activate the dopants. In order to help in the development of improved p-type doped GaN and other group III-nitrides, we have undertaken a study of the Raman spectroscopy of p-type doped GaN under a variety of processing conditions.