I. Mitsuishi, Y. Ezoe, K. Ishizu, T. Moriyama, Y. Maeda, T. Hayashi, T. Sato, M. Mita, N. Yamasaki, K. Mitsuda, M. Horade, S. Sugiyama, R. Riveros, T. Boggs, H. Yamaguchi, Y. Kanamori, K. Nakajima, R. Maeda
{"title":"单级MEMS x射线光学系统的x射线成像测试","authors":"I. Mitsuishi, Y. Ezoe, K. Ishizu, T. Moriyama, Y. Maeda, T. Hayashi, T. Sato, M. Mita, N. Yamasaki, K. Mitsuda, M. Horade, S. Sugiyama, R. Riveros, T. Boggs, H. Yamaguchi, Y. Kanamori, K. Nakajima, R. Maeda","doi":"10.1109/OMEMS.2010.5672138","DOIUrl":null,"url":null,"abstract":"An X-ray imaging test for an X-ray optical system based on MEMS technologies was conducted at the ISAS 30 m beamline. An X-ray reflection and focusing were successfully verified at Al Kα 1.49 keV for the first time. The image quality estimated as a half power diameter was ~20 arcmin. This was consistent with the angular resolution estimated from the surface roughness of 200 nm rms at 100 μm scale. In this paper, the experimental setup and the result of X-ray imaging analysis are reported.","PeriodicalId":421895,"journal":{"name":"2010 International Conference on Optical MEMS and Nanophotonics","volume":"76 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-12-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"X-ray imaging test for a single-stage MEMS X-ray optical system\",\"authors\":\"I. Mitsuishi, Y. Ezoe, K. Ishizu, T. Moriyama, Y. Maeda, T. Hayashi, T. Sato, M. Mita, N. Yamasaki, K. Mitsuda, M. Horade, S. Sugiyama, R. Riveros, T. Boggs, H. Yamaguchi, Y. Kanamori, K. Nakajima, R. Maeda\",\"doi\":\"10.1109/OMEMS.2010.5672138\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An X-ray imaging test for an X-ray optical system based on MEMS technologies was conducted at the ISAS 30 m beamline. An X-ray reflection and focusing were successfully verified at Al Kα 1.49 keV for the first time. The image quality estimated as a half power diameter was ~20 arcmin. This was consistent with the angular resolution estimated from the surface roughness of 200 nm rms at 100 μm scale. In this paper, the experimental setup and the result of X-ray imaging analysis are reported.\",\"PeriodicalId\":421895,\"journal\":{\"name\":\"2010 International Conference on Optical MEMS and Nanophotonics\",\"volume\":\"76 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-12-17\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 International Conference on Optical MEMS and Nanophotonics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/OMEMS.2010.5672138\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 International Conference on Optical MEMS and Nanophotonics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/OMEMS.2010.5672138","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
X-ray imaging test for a single-stage MEMS X-ray optical system
An X-ray imaging test for an X-ray optical system based on MEMS technologies was conducted at the ISAS 30 m beamline. An X-ray reflection and focusing were successfully verified at Al Kα 1.49 keV for the first time. The image quality estimated as a half power diameter was ~20 arcmin. This was consistent with the angular resolution estimated from the surface roughness of 200 nm rms at 100 μm scale. In this paper, the experimental setup and the result of X-ray imaging analysis are reported.
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