Kyunghwan Kim, Kangseop Lee, Seung-Uk Choi, Ji-Seong Kim, Chan-Gyu Choi, Ho-Jin Song
{"title":"一种97-107 GHz三叠场效应晶体管功率放大器,峰值增益23.7dB, PSAT 15.1dBm, PAEMAX 18.6%,采用28nm FD-SOI CMOS","authors":"Kyunghwan Kim, Kangseop Lee, Seung-Uk Choi, Ji-Seong Kim, Chan-Gyu Choi, Ho-Jin Song","doi":"10.1109/RFIC54546.2022.9863175","DOIUrl":null,"url":null,"abstract":"A 97–107 GHz power amplifier (PA) based on a stacked-FET topology is presented. In a triple-stacked-FeT structure, stacking efficiency is analyzed using four combinations of series or shunt inductors for compensating phase of impedances between stack nodes, and optimal inductances are chosen. Phase-compensation inductors are implemented by considering a finite quality factor with the tradeoff between layout size and stacking efficiency. A layout of a transistor cell is customized to reduce gate resistance. The triple-stacked-FET PA provides peak PSAT and PAEMAX of 15.1 dBm and 18.6%, respectively. The presented PA achieves the highest power density and efficiency compared to state-of-the-art CMOS PAs in F-band.","PeriodicalId":415294,"journal":{"name":"2022 IEEE Radio Frequency Integrated Circuits Symposium (RFIC)","volume":"31 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-06-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"A 97–107 GHz Triple-Stacked-FET Power Amplifier with 23.7dB Peak Gain, 15.1dBm PSAT, and 18.6% PAEMAX in 28-nm FD-SOI CMOS\",\"authors\":\"Kyunghwan Kim, Kangseop Lee, Seung-Uk Choi, Ji-Seong Kim, Chan-Gyu Choi, Ho-Jin Song\",\"doi\":\"10.1109/RFIC54546.2022.9863175\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A 97–107 GHz power amplifier (PA) based on a stacked-FET topology is presented. In a triple-stacked-FeT structure, stacking efficiency is analyzed using four combinations of series or shunt inductors for compensating phase of impedances between stack nodes, and optimal inductances are chosen. Phase-compensation inductors are implemented by considering a finite quality factor with the tradeoff between layout size and stacking efficiency. A layout of a transistor cell is customized to reduce gate resistance. The triple-stacked-FET PA provides peak PSAT and PAEMAX of 15.1 dBm and 18.6%, respectively. The presented PA achieves the highest power density and efficiency compared to state-of-the-art CMOS PAs in F-band.\",\"PeriodicalId\":415294,\"journal\":{\"name\":\"2022 IEEE Radio Frequency Integrated Circuits Symposium (RFIC)\",\"volume\":\"31 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-06-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2022 IEEE Radio Frequency Integrated Circuits Symposium (RFIC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/RFIC54546.2022.9863175\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 IEEE Radio Frequency Integrated Circuits Symposium (RFIC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RFIC54546.2022.9863175","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A 97–107 GHz Triple-Stacked-FET Power Amplifier with 23.7dB Peak Gain, 15.1dBm PSAT, and 18.6% PAEMAX in 28-nm FD-SOI CMOS
A 97–107 GHz power amplifier (PA) based on a stacked-FET topology is presented. In a triple-stacked-FeT structure, stacking efficiency is analyzed using four combinations of series or shunt inductors for compensating phase of impedances between stack nodes, and optimal inductances are chosen. Phase-compensation inductors are implemented by considering a finite quality factor with the tradeoff between layout size and stacking efficiency. A layout of a transistor cell is customized to reduce gate resistance. The triple-stacked-FET PA provides peak PSAT and PAEMAX of 15.1 dBm and 18.6%, respectively. The presented PA achieves the highest power density and efficiency compared to state-of-the-art CMOS PAs in F-band.