{"title":"一种改进的探针锐化技术(微电子失效分析)","authors":"M. Kimball","doi":"10.1109/RELPHY.1990.66064","DOIUrl":null,"url":null,"abstract":"An electrochemical probe-sharpening technique with useful microelectronics applications is discussed. This technique was originally designed for scanning tunneling microscope tips. Probe tips produced by the technique are both sharp and strong. In addition, the tip radius is easily set by monitoring current flow during the etch, making it possible to automate the procedure. A circuit for this purpose is given.<<ETX>>","PeriodicalId":409540,"journal":{"name":"28th Annual Proceedings on Reliability Physics Symposium","volume":"289 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-03-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"An improved probe sharpening technique (microelectronics failure analysis)\",\"authors\":\"M. Kimball\",\"doi\":\"10.1109/RELPHY.1990.66064\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An electrochemical probe-sharpening technique with useful microelectronics applications is discussed. This technique was originally designed for scanning tunneling microscope tips. Probe tips produced by the technique are both sharp and strong. In addition, the tip radius is easily set by monitoring current flow during the etch, making it possible to automate the procedure. A circuit for this purpose is given.<<ETX>>\",\"PeriodicalId\":409540,\"journal\":{\"name\":\"28th Annual Proceedings on Reliability Physics Symposium\",\"volume\":\"289 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1990-03-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"28th Annual Proceedings on Reliability Physics Symposium\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/RELPHY.1990.66064\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"28th Annual Proceedings on Reliability Physics Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RELPHY.1990.66064","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
An improved probe sharpening technique (microelectronics failure analysis)
An electrochemical probe-sharpening technique with useful microelectronics applications is discussed. This technique was originally designed for scanning tunneling microscope tips. Probe tips produced by the technique are both sharp and strong. In addition, the tip radius is easily set by monitoring current flow during the etch, making it possible to automate the procedure. A circuit for this purpose is given.<>
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