基于cnfet的超低功耗8T SRAM电池

S. Arif, S. Pal
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引用次数: 3

摘要

在CMOS等超短通道器件中,局部和全局工艺波动导致阈值电压(V)变化增加。因此,在低于600 mV的电压下操作基于CMOS的6晶体管(6T) SRAM单元是不可能的。因此,为了减轻工艺波动的影响,本文提出了一种基于CNFET的8T SRAM单元。对于所提出的单元,访问了SRAM单元的不同设计指标,并将其设计指标与常规对应的设计指标进行比较,以显示其有效性。与传统的基于CMOS的8T电池相比,该电池在保持模式下消耗的功率降低了2.06倍,并且在写延迟(读延迟)方面也提高了5.23× (4.41×) @ 200 mV。它通过显示相同电源电压下更窄的写延迟(95.17%)、读延迟(75.20%)和保持功耗(87.34%)来描述其对过程波动的鲁棒性。所提出的基于CNFET的8T电池在400 mV时的读取稳定性比基于CMOS的8T SRAM电池高59.41%。
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Variation-resilient CNFET-based 8T SRAM cell for ultra-low-power application
Local and global process fluctuations causes increase in threshold voltage (V,) variation in ultra-short channel devices like CMOS. Therefore, it is not possible to operate the CMOS based 6-Transistor (6T) SRAM cell bellow 600 mV. Hence, to mitigate the effect of process fluctuations a CNFET based 8T SRAM cell is proposed in this article. Different design metrics of an SRAM cell are accessed for the proposed cell and to show its effectiveness, the design metrics are compared with its conventional counterpart. The proposed cell consumes 2.06× less power during hold mode and it also offers improvement in write delay (read delay) by 5.23× (4.41×) @ 200 mV compared to conventional CMOS based 8T cell. It depicts its robustness against process fluctuations by showing narrower spread in write delay (95.17%), read delay (75.20%) and hold power consumption (87.34%) for the same supply voltage. The proposed CNFET based 8T cell shows 59.41% higher read stability @ 400 mV than the CMOS based 8T SRAM cell.
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