锡铋共晶焊料与铜互连中Bi偏析的透射电镜研究

P. Shang, Z.Q. Liu, L. Zhang, D.X. Li, J. Shang
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引用次数: 0

摘要

用透射电镜研究了样品在回流和固相时效后共晶SnBi与Cu之间的界面反应。分析了回流和固态时效过程中SnBi/Cu界面的微观组织演变。结果表明:试样回流后,钎料与Cu界面处形成Cu3Sn和Cu6Sn5两层金属间化合物(IMCs);在Cu3Sn和Cu界面处观察到Bi的偏析。此外,在固相时效过程中,铋的偏析诱导Cu3Sn/Cu界面处形成孔洞。
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TEM Study of Bi Segregation in the Interconnect of Eutectic Tin-Bismuth Solder and Copper
The interfacial reaction between eutectic SnBi and Cu was studied by TEM after the sample was reflowed and aged in solid state, respectively. The microstructural evolution at the SnBi/Cu interface during reflowed and solid-state aged process was analyzed. The results show that there are two layers of intermetallic compounds (IMCs), Cu3Sn and Cu6Sn5, located at the interface between solder and Cu after the sample was reflowed. The segregation of Bi at the interface between Cu3Sn and Cu was observed. Furthermore, the segregation of Bi induced the formation of voids at Cu3Sn/Cu interface during solid-state aging process.
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