{"title":"深亚微米MOS器件和电路可靠性仿真的紧凑模型","authors":"Zhi-Yuan Cui, J. Liou","doi":"10.1109/EDSSC.2005.1635289","DOIUrl":null,"url":null,"abstract":"Continuing down scaling in CMOS technology has resulted in an increasing and urgent need for a Spice-like reliability model that is capable of predicting the long-term degradation of MOS devices and ICs. In this paper, we develop such a model based on the industry standard BSIM3 model and empirical degradation expressions for the threshold voltage and mobility of MOSFETs. The model is implemented in Cadence Spectre via Verilog-A, and measured data obtained from devices fabricated from the 0.18-μm CMOS technology have been included in support of the model development.","PeriodicalId":429314,"journal":{"name":"2005 IEEE Conference on Electron Devices and Solid-State Circuits","volume":"41 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A Compact Model for Reliability Simulation of Deep-Submicron MOS Devices and Circuits\",\"authors\":\"Zhi-Yuan Cui, J. Liou\",\"doi\":\"10.1109/EDSSC.2005.1635289\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Continuing down scaling in CMOS technology has resulted in an increasing and urgent need for a Spice-like reliability model that is capable of predicting the long-term degradation of MOS devices and ICs. In this paper, we develop such a model based on the industry standard BSIM3 model and empirical degradation expressions for the threshold voltage and mobility of MOSFETs. The model is implemented in Cadence Spectre via Verilog-A, and measured data obtained from devices fabricated from the 0.18-μm CMOS technology have been included in support of the model development.\",\"PeriodicalId\":429314,\"journal\":{\"name\":\"2005 IEEE Conference on Electron Devices and Solid-State Circuits\",\"volume\":\"41 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-12-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2005 IEEE Conference on Electron Devices and Solid-State Circuits\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/EDSSC.2005.1635289\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2005 IEEE Conference on Electron Devices and Solid-State Circuits","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EDSSC.2005.1635289","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A Compact Model for Reliability Simulation of Deep-Submicron MOS Devices and Circuits
Continuing down scaling in CMOS technology has resulted in an increasing and urgent need for a Spice-like reliability model that is capable of predicting the long-term degradation of MOS devices and ICs. In this paper, we develop such a model based on the industry standard BSIM3 model and empirical degradation expressions for the threshold voltage and mobility of MOSFETs. The model is implemented in Cadence Spectre via Verilog-A, and measured data obtained from devices fabricated from the 0.18-μm CMOS technology have been included in support of the model development.