(100)硅衬底上Ga2O3三极管的演示

S. Yuvaraja, Vishal Khandelwal, S. Krishna, Yi Lu, Zhiyuan Liu, Mritunjay Kumar, Dhanu Chettri, Xiao Tang, Glen Issac Maciel Garcia, Che-Hao Liao, Xiaohang Li
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引用次数: 0

摘要

在本文中,我们展示了在硅衬底上异质集成的UWBG Ga2O3三极管。该三极管工作在耗尽模式下,具有良好的离子/开关比(105)和高跨导(1 μS)。其次是迁移率约为1.2 cm2/V。这项工作表明,超宽带隙氧化物晶体管可以在各种异质衬底上制造,以实现高集成度,低成本和强大的电子器件。
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Demonstration of Ga2O3 trigate transistors on (100) silicon substrates
In this paper we demonstrated the UWBG Ga2O3 trigate transistors heterogeneously integrated on silicon substrate. This trigate transistor operates in depletion mode having decent Ion/Ioff ratio (105) and high transconductance (1 μS). Followed by the mobility is around 1.2 cm2/V. s. This work suggests that the ultrawide bandgap oxide transistors can be fabricated on various heterogenous substrates to achieve highly integrated, low cost, and robust electronics.
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