电源电压和温度对CNFET和纳米级Si-MOSFET sram稳定性和性能影响的比较研究

M. Moradinasab, F. Karbassian, M. Fathipour
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引用次数: 16

摘要

本文研究了电源电压和温度对静态随机存取存储器(SRAM)特性的影响。研究了基于碳纳米管场效应晶体管(cnfet)和硅MOSFET晶体管(si -MOSFET)的两种纳米SRAM电池在32nm技术节点上的应用。仿真研究表明,CNFET SRAM对电源电压变化和温度影响的稳定性大于Si-MOSFET SRAM。进一步研究了这两个参数对32k SRAM阵列电路性能的影响。结果表明,基于手性向量大于(23,0)的CNFET SRAM阵列的读访问时间比传统的MOSFET SRAM阵列短。
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A comparison study of the effects of supply voltage and temperature on the stability and performance of CNFET and nanoscale Si-MOSFET SRAMs
In this paper we investigate the effects of supply voltage and the temperature on the characteristics of the Static Random Access Memory (SRAM). Two nanoscale SRAM cells based on Carbon Nanotube Field Effect Transistors (CNFETs) and Silicon MOSFET Transistors (Si-MOSFETs) were investigated for application in 32nm technology node. Simulation studies show that the stability of CNFET SRAM against supply voltage variation and temperature influences is larger than those of its Si-MOSFET SRAM counterpart. Furthermore, the circuit performance affected by these two parameters in a 32k SRAM array was investigated. The results show that the read access time in CNFET SRAM arrays based on chirality vectors bigger than (23,0), is less than conventional MOSFET SRAM array.
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