化学镀铜微细线电路制造技术

H. Akahoshi, M. Kawamoto, T. Itabashi, O. Miura, A. Takahashi, S. Kobayashi, M. Miyazaki, T. Mutho, M. Wajima, T. Ishimaru
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引用次数: 19

摘要

开发了两种用于化学镀铜精细电路图形制造技术的增材工艺。该工艺提供高尺寸精度。本文报道了增材工艺的技术方面、制造增材电路的材料以及这些电路的性能。
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Fine line circuit manufacturing technology with electroless copper plating
Two types of additive processes for fine circuit pattern manufacturing technology using electroless copper plating have been developed. The processes offer high dimensional accuracy. Technical aspects of the additive processes, materials for the fabrication of additive circuits, and the performance of these circuits are reported here.<>
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