Yunlong Li, G. Karve, P. Malinowski, J. Kim, Epimitheas Georgitzikis, V. Pejović, M. Lim, L. M. Hagelsieb, R. Puybaret, I. Lieberman, Jiwon Lee, D. Cheyns, P. Heremans, H. Osman, D. Tezcan
{"title":"胶体量子点图像传感器的晶圆级像素化","authors":"Yunlong Li, G. Karve, P. Malinowski, J. Kim, Epimitheas Georgitzikis, V. Pejović, M. Lim, L. M. Hagelsieb, R. Puybaret, I. Lieberman, Jiwon Lee, D. Cheyns, P. Heremans, H. Osman, D. Tezcan","doi":"10.1109/vlsitechnologyandcir46769.2022.9830334","DOIUrl":null,"url":null,"abstract":"Monolithic integration of colloidal quantum dot (CQD) thin-film on 200 mm CMOS wafers is demonstrated. Full pixelation of CQD thin-film photodiodes at wafer level is presented for the first time. We show a low-temperature process flow compatible with standard CMOS fab equipment. The self-aligned pixelation approach is an improvement over a conventional way of having a thin-film absorber layer on pixelated bottom electrodes, and it enables crosstalk reduction as well as multi-stack arrays.","PeriodicalId":332454,"journal":{"name":"2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2022-06-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Wafer Level Pixelation of Colloidal Quantum Dot Image Sensors\",\"authors\":\"Yunlong Li, G. Karve, P. Malinowski, J. Kim, Epimitheas Georgitzikis, V. Pejović, M. Lim, L. M. Hagelsieb, R. Puybaret, I. Lieberman, Jiwon Lee, D. Cheyns, P. Heremans, H. Osman, D. Tezcan\",\"doi\":\"10.1109/vlsitechnologyandcir46769.2022.9830334\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Monolithic integration of colloidal quantum dot (CQD) thin-film on 200 mm CMOS wafers is demonstrated. Full pixelation of CQD thin-film photodiodes at wafer level is presented for the first time. We show a low-temperature process flow compatible with standard CMOS fab equipment. The self-aligned pixelation approach is an improvement over a conventional way of having a thin-film absorber layer on pixelated bottom electrodes, and it enables crosstalk reduction as well as multi-stack arrays.\",\"PeriodicalId\":332454,\"journal\":{\"name\":\"2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-06-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/vlsitechnologyandcir46769.2022.9830334\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/vlsitechnologyandcir46769.2022.9830334","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Wafer Level Pixelation of Colloidal Quantum Dot Image Sensors
Monolithic integration of colloidal quantum dot (CQD) thin-film on 200 mm CMOS wafers is demonstrated. Full pixelation of CQD thin-film photodiodes at wafer level is presented for the first time. We show a low-temperature process flow compatible with standard CMOS fab equipment. The self-aligned pixelation approach is an improvement over a conventional way of having a thin-film absorber layer on pixelated bottom electrodes, and it enables crosstalk reduction as well as multi-stack arrays.