{"title":"脉冲操作引起的电迁移电流密度依赖性t/sub - 50/增强","authors":"J. Suehle, H. Schafft","doi":"10.1109/RELPHY.1990.66071","DOIUrl":null,"url":null,"abstract":"Two effects that complicate the electromigration characterization of metallization for pulsed stress are discussed. One is the dependence of the t/sub 50/ enhancement (due to pulsed operation) on current density, and the other is a decrease of this enhancement over a range of frequencies (0.2 to 2 MHz) that is connected with the Joule heating. These effects are discussed in terms of changes in the buildup and relaxation response times of the excess vacancy concentrations.<<ETX>>","PeriodicalId":409540,"journal":{"name":"28th Annual Proceedings on Reliability Physics Symposium","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-03-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":"{\"title\":\"Current density dependence of electromigration t/sub 50/ enhancement due to pulsed operation\",\"authors\":\"J. Suehle, H. Schafft\",\"doi\":\"10.1109/RELPHY.1990.66071\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Two effects that complicate the electromigration characterization of metallization for pulsed stress are discussed. One is the dependence of the t/sub 50/ enhancement (due to pulsed operation) on current density, and the other is a decrease of this enhancement over a range of frequencies (0.2 to 2 MHz) that is connected with the Joule heating. These effects are discussed in terms of changes in the buildup and relaxation response times of the excess vacancy concentrations.<<ETX>>\",\"PeriodicalId\":409540,\"journal\":{\"name\":\"28th Annual Proceedings on Reliability Physics Symposium\",\"volume\":\"20 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1990-03-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"9\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"28th Annual Proceedings on Reliability Physics Symposium\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/RELPHY.1990.66071\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"28th Annual Proceedings on Reliability Physics Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RELPHY.1990.66071","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Current density dependence of electromigration t/sub 50/ enhancement due to pulsed operation
Two effects that complicate the electromigration characterization of metallization for pulsed stress are discussed. One is the dependence of the t/sub 50/ enhancement (due to pulsed operation) on current density, and the other is a decrease of this enhancement over a range of frequencies (0.2 to 2 MHz) that is connected with the Joule heating. These effects are discussed in terms of changes in the buildup and relaxation response times of the excess vacancy concentrations.<>
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