改进了石英晶体制造和振荡器要求之间的相关性

J. Kusters
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引用次数: 1

摘要

用于振荡器的石英晶体参数规范是一门不精确的科学。在许多情况下,测量的晶体性能由供应商确定,以满足或超过规定的规格。然而,晶体在振荡器中不会像预期的那样工作。在中心频率和调谐范围中尤其如此。在惠普(现在的安捷伦科技公司)生产石英晶体的近40年里,我们投入了大量的工程资源,在整个过程中不断提高产量。该工作的一部分集中在需要具有可重复的中心频率,公差为/spl plusmn/0.3 ppm,并且对于10 MHz, 3/sup /泛音,SC-cut,机械调谐范围始终至少为/spl plusmn/1 ppm。振荡器的持续发展最终导致EFC范围要求始终至少为/spl plusmn/0.5 ppm。实现高产量要求的关键是几个因素。首先,使用s参数网络分析仪进行最后的频率电镀,该分析仪带有足够的软件来测量晶体在未来操作点的性能。其次是对振荡器性能的深入了解,特别是在机械和电子调谐范围的终点。第三是愿意扰动晶体参数,以满足振荡器电子器件的持续变化。
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Improved correlation between quartz crystal manufacturing and oscillator requirements
Specification of quartz crystal parameters for oscillator applications is an inexact science. In many cases, the measured crystal performance is determined by the vendor to meet or exceed the stated specifications. Yet, the crystal will not perform as expected in the oscillator. This is especially true in center frequency and in tuning range. During the nearly 40 years that Hewlett-Packard, now Agilent Technologies, produced quartz crystals, we devoted significant engineering resources to continually increase yield throughout the entire process. Part of that work was centered on the need to have repeatable center frequency with a tolerance of /spl plusmn/0.3 ppm and a mechanical tuning range that was always at least /spl plusmn/1 ppm for a 10 MHz, 3/sup rd/ overtone, SC-cut. Continuing oscillator development eventually led to an EFC range requirement that was always at least /spl plusmn/0.5 ppm.. Key to achieving the requirements with high yield are several factors. First, the final frequency plating is done using an S-parameter network analyzer with adequate software to measure crystal performance at its future operating points. Second is an intimate knowledge of the oscillator performance, especially at the end points of both the mechanical and electrical tuning ranges. Third is a willingness to perturb the crystal parameters to meet continuing changes in the oscillator electronics.
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