GaN肖特基二极管中后势垒层中碳对表面电场峰的影响

B. Bakeroot, B. D. Jaeger, N. Ronchi, S. Stoffels, M. Zhao, S. Decoutere
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引用次数: 0

摘要

采用计算机辅助设计模拟技术,评估了硅基氮化镓硅片背势垒层中碳对氮化镓肖特基二极管电压分布的影响。结果表明,碳不能像通常认为的那样仅仅作为受体存在。为了解释在GaN-onSi肖特基二极管中观察到的高硬击穿电压,碳需要被供体补偿或部分电非活性。此外,研究表明,碳的供体补偿水平将对器件中的二维电压分布产生显著影响,从而对表面电场峰产生显著影响。这一结论对肖特基二极管场极板扩展的设计具有重要的参考价值。
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The influence of carbon in the back-barrier layers on the surface electric field peaks in GaN Schottky diodes
Technology Computer Aided Design simulations are used to assess the influence of carbon in the back-barrier layers of GaN-on-Si wafers on the voltage distribution in GaN Schottky diodes. It is shown that carbon cannot be present as an acceptor only – as it is commonly assumed. The carbon needs to be compensated by donors or partly electrically inactive in order to explain the observed high hard breakdown voltage in GaN-onSi Schottky diodes. Furthermore, it is shown that the level of donor compensation of the carbon will have a significant influence on the two-dimensional voltage distribution in the devices, and, hence, on the surface electric field peaks. This conclusion is important to consider in the design of field plate extensions of the Schottky diode.
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