{"title":"集成80 v d类功率输出级,在0.14µm SOI BCD工艺中效率为94%","authors":"Haifeng Ma, R. V. D. Zee, B. Nauta","doi":"10.1109/ESSCIRC.2013.6649079","DOIUrl":null,"url":null,"abstract":"In this paper we present a highly-efficient 80V class-D power stage design in a 0.14μm SOI-based BCD process. Immunity to the on-chip supply bounce is realized by internally regulated floating supplies, variable driving strength for the gate driver, and an efficient 2-step level shifter design. Fast switching transition and minimized switching loss are achieved with a 94% peak efficiency in the realized chip.","PeriodicalId":183620,"journal":{"name":"2013 Proceedings of the ESSCIRC (ESSCIRC)","volume":"212 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-10-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":"{\"title\":\"An integrated 80-V class-D power output stage with 94% efficiency in a 0.14µm SOI BCD process\",\"authors\":\"Haifeng Ma, R. V. D. Zee, B. Nauta\",\"doi\":\"10.1109/ESSCIRC.2013.6649079\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper we present a highly-efficient 80V class-D power stage design in a 0.14μm SOI-based BCD process. Immunity to the on-chip supply bounce is realized by internally regulated floating supplies, variable driving strength for the gate driver, and an efficient 2-step level shifter design. Fast switching transition and minimized switching loss are achieved with a 94% peak efficiency in the realized chip.\",\"PeriodicalId\":183620,\"journal\":{\"name\":\"2013 Proceedings of the ESSCIRC (ESSCIRC)\",\"volume\":\"212 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2013-10-31\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2013 Proceedings of the ESSCIRC (ESSCIRC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ESSCIRC.2013.6649079\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 Proceedings of the ESSCIRC (ESSCIRC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESSCIRC.2013.6649079","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
An integrated 80-V class-D power output stage with 94% efficiency in a 0.14µm SOI BCD process
In this paper we present a highly-efficient 80V class-D power stage design in a 0.14μm SOI-based BCD process. Immunity to the on-chip supply bounce is realized by internally regulated floating supplies, variable driving strength for the gate driver, and an efficient 2-step level shifter design. Fast switching transition and minimized switching loss are achieved with a 94% peak efficiency in the realized chip.