纳米级晶体管的新方面

K. Natori, T. Kurusu
{"title":"纳米级晶体管的新方面","authors":"K. Natori, T. Kurusu","doi":"10.1109/IWNC.2006.4570997","DOIUrl":null,"url":null,"abstract":"New aspect of device characteristics emerging in nanostructured transistors are reviewed. Three topics are introduced and discussed. First, a new type of parasitic capacitance related to the charge layer thickness in capacitor electrode is discussed. Next, the quasi-ballistic operation of MOSFETs is analyzed in three aspects- one is the reflection-transmission formalism of MOS transport, another is an analysis of the device by Monte Carlo simulation, and the other discusses influence of device structure on its transport. In the last, we compare performance of a carbon nanotube FET to that of a silicon MOSFET.","PeriodicalId":356139,"journal":{"name":"2006 International Workshop on Nano CMOS","volume":"25 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Novel aspects of nanoscale transistors\",\"authors\":\"K. Natori, T. Kurusu\",\"doi\":\"10.1109/IWNC.2006.4570997\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"New aspect of device characteristics emerging in nanostructured transistors are reviewed. Three topics are introduced and discussed. First, a new type of parasitic capacitance related to the charge layer thickness in capacitor electrode is discussed. Next, the quasi-ballistic operation of MOSFETs is analyzed in three aspects- one is the reflection-transmission formalism of MOS transport, another is an analysis of the device by Monte Carlo simulation, and the other discusses influence of device structure on its transport. In the last, we compare performance of a carbon nanotube FET to that of a silicon MOSFET.\",\"PeriodicalId\":356139,\"journal\":{\"name\":\"2006 International Workshop on Nano CMOS\",\"volume\":\"25 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2006 International Workshop on Nano CMOS\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IWNC.2006.4570997\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 International Workshop on Nano CMOS","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IWNC.2006.4570997","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

综述了纳米结构晶体管器件特性的新方面。本文介绍并讨论了三个主题。首先,讨论了一种与电容电极电荷层厚度相关的新型寄生电容。其次,从三个方面分析了mosfet的准弹道工作,一是MOS输运的反射-传输形式,二是通过蒙特卡罗模拟对器件进行了分析,三是讨论了器件结构对其输运的影响。最后,我们比较了碳纳米管场效应管与硅MOSFET的性能。
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Novel aspects of nanoscale transistors
New aspect of device characteristics emerging in nanostructured transistors are reviewed. Three topics are introduced and discussed. First, a new type of parasitic capacitance related to the charge layer thickness in capacitor electrode is discussed. Next, the quasi-ballistic operation of MOSFETs is analyzed in three aspects- one is the reflection-transmission formalism of MOS transport, another is an analysis of the device by Monte Carlo simulation, and the other discusses influence of device structure on its transport. In the last, we compare performance of a carbon nanotube FET to that of a silicon MOSFET.
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