Shuhei Kitajima, Katsuya Kito, T. Matsuda, M. Kimura, Masahide Inoue
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Characteristic evaluation of photo-induced current by infrared light irradiation in low-temperature poly-Si TFT
We confirmed that photo-induced current in off region changes when we irradiate infrared light to N-type, P-type and PIN-type low-temperature poly-Si TFTs. In addition, we found that the photo-induced current is proportional to the gate width, whereas it does not depend on the gate length. We can indicate that it is possible to detect infrared light above certain intensity from the relationship between the photo-induced current and the dark current.