使用时间分辨扫描非线性介电显微镜的同时局部电容电压谱和深能级瞬态光谱

Yasuo Cho
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摘要

扫描非线性介电显微镜(SNDM)是一种扫描探针技术,测量探针尖端和电压偏压样品之间振荡频率的变化。当探针在半导体器件表面移动时,振荡频率会随着介电特性、电荷和载流子密度、掺杂剂浓度、界面状态或影响局部电容的任何其他变量的变化而变化。在过去的几年里,东北大学的研究人员对介电显微镜进行了几项改进,最新的改进是一种称为时间分辨SNDM (tr-SNDM)的数字版本。在这里,他们描述了他们的新技术,并介绍了一个应用,其中它用于从SiO2/SiC界面样品中获取CV, dC/dV-V和DLTS数据。
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Simultaneous Local Capacitance-Voltage Profiling and Deep Level Transient Spectroscopy Using Time-Resolved Scanning Nonlinear Dielectric Microscopy
Scanning nonlinear dielectric microscopy (SNDM) is a scanning probe technique that measures changes in oscillation frequency between the probe tip and a voltage-biased sample. As the probe moves across the surface of a semiconductor device, the oscillation frequency changes in response to variations in dielectric properties, charge and carrier density, dopant concentration, interface states, or any number of other variables that affect local capacitance. Over the past few years, researchers at Tohoku University have made several improvements in dielectric microscopy, the latest of which is a digital version called time-resolved SNDM (tr-SNDM). Here they describe their new technique and present an application in which it is used to acquire CV, dC/dV-V, and DLTS data from SiO2/SiC interface samples.
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