应变对InAs和InSb高场电子输运影响的蒙特卡罗研究

H. Nishino, I. Kawahira, F. Machida, S. Hara, H. Fujishiro
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引用次数: 4

摘要

我们用经验赝势法计算了InAs和InSb的非应变带和应变带结构。在保持能量和动量守恒的情况下,计算碰撞电离阈能Eth。然后用蒙特卡罗(MC)方法研究了未应变和应变的InAs和InSb中的电子输运。在InAs和InSb中,平均电子速度vd随电场强度f单调增加。拉伸应变使低场电子迁移率μ增大,反之亦然,这是由于Γ谷的有效质量m||∗(Γ)依赖于应变。在高f处,由于冲击电离损失了大部分能量,许多电子被限制在Γ谷的底部,这导致在高f处vd保持较大。拉伸应变使Eth变小,然后使冲击电离系数α增大,反之亦然。因此,高f处的vd在拉伸应变下变大,在压缩应变下变小。
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Monte Carlo study of strain effect on high field electron transport in InAs and InSb
We calculate the unstrained and the strained band structures of InAs and InSb by means of the empirical pseudopotential method. The impact ionization threshold energy, Eth, is calculated while keeping the energy and momentum conservation. Then the electron transport in the unstrained and the strained InAs and InSb is investigated by using the Monte Carlo (MC) method. In both InAs and InSb, the average electron velocity, vd, increases monotonically with the electric field strength, f. The tensile strain makes the low field electron mobility, μ, higher, and vice versa, which is resulted from the dependence of the effective mass in the Γ valley, m||∗(Γ), on the strain. At the high f, many electrons are restricted within the bottom of the Γ valley because of losing most of their energy by the impact ionization, which results in keeping vd large at the high f. The tensile strain makes Eth smaller and then the impact ionization coefficient, α, larger, and vice versa. Consequently, vd at the high f becomes larger under the tensile strain and smaller under the compressive strain.
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