一个16Mb双模ReRAM宏,具有低于14ns的内存计算和内存功能,通过自写终止方案启用

Wei-Hao Chen, W. Lin, Li-Ya Lai, Shuangchen Li, Chien-Hua Hsu, Huan-Ting Lin, Heng-Yuan Lee, Jian-Wei Su, Yuan Xie, S. Sheu, Meng-Fan Chang
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引用次数: 51

摘要

最近的ReRAM器件使超越冯·诺依曼结构的内存计算(CIM)的发展成为可能。然而,在ReRAM电阻(R)的广泛分布导致CIM操作的低成品率。本工作提出了一种双模计算(DMc) ReRAM宏结构,该结构具有双功能电压模式自写终止(DV-SWT)方案,以高产量实现存储器和基本CIM功能(and, OR和XOR操作)。DV-SWT通过抑制由宏观ir下降和工艺变化引起的r变化来增加CIM操作的读取裕量。采用1T1R HfO ReRAM器件和0.15um CMOS工艺制备了16Mb DMc-ReRAM全功能宏。测量到的CIM操作延迟小于14ns,比以前基于reram的CIM工作快86+x。这项工作也代表了第一个将ReRAM器件和CIM外围电路完全集成在同一芯片上的CIM ReRAM宏。
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A 16Mb dual-mode ReRAM macro with sub-14ns computing-in-memory and memory functions enabled by self-write termination scheme
Recent ReRAM devices enable the development of computing-in-memory (CIM) for beyond von Neumann structure. However, wide distribution in ReRAM resistance (R) causes low yield for CIM operations. This work proposes a dual-mode computing (DMc) ReRAM macro structure with a dual-function voltage-mode self-write termination (DV-SWT) scheme to achieve both memory and fundamental CIM functions (AND, OR and XOR operations) with high yield. The DV-SWT increases the read margin for CIM operations by suppressing the R-variations caused by macro-level IR-drop and process variations. A 16Mb DMc-ReRAM full-function macro was fabricated using 1T1R HfO ReRAM devices and 0.15um CMOS process. The measured delay of the CIM operations is less than 14ns, which is 86+x faster than previous ReRAM-based CIM works. This work also represents the first CIM ReRAM macro with ReRAM device and CIM-peripheral circuits fully integrated on the same die.
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