Wei-Hao Chen, W. Lin, Li-Ya Lai, Shuangchen Li, Chien-Hua Hsu, Huan-Ting Lin, Heng-Yuan Lee, Jian-Wei Su, Yuan Xie, S. Sheu, Meng-Fan Chang
{"title":"一个16Mb双模ReRAM宏,具有低于14ns的内存计算和内存功能,通过自写终止方案启用","authors":"Wei-Hao Chen, W. Lin, Li-Ya Lai, Shuangchen Li, Chien-Hua Hsu, Huan-Ting Lin, Heng-Yuan Lee, Jian-Wei Su, Yuan Xie, S. Sheu, Meng-Fan Chang","doi":"10.1109/IEDM.2017.8268468","DOIUrl":null,"url":null,"abstract":"Recent ReRAM devices enable the development of computing-in-memory (CIM) for beyond von Neumann structure. However, wide distribution in ReRAM resistance (R) causes low yield for CIM operations. This work proposes a dual-mode computing (DMc) ReRAM macro structure with a dual-function voltage-mode self-write termination (DV-SWT) scheme to achieve both memory and fundamental CIM functions (AND, OR and XOR operations) with high yield. The DV-SWT increases the read margin for CIM operations by suppressing the R-variations caused by macro-level IR-drop and process variations. A 16Mb DMc-ReRAM full-function macro was fabricated using 1T1R HfO ReRAM devices and 0.15um CMOS process. The measured delay of the CIM operations is less than 14ns, which is 86+x faster than previous ReRAM-based CIM works. This work also represents the first CIM ReRAM macro with ReRAM device and CIM-peripheral circuits fully integrated on the same die.","PeriodicalId":412333,"journal":{"name":"2017 IEEE International Electron Devices Meeting (IEDM)","volume":"10 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"51","resultStr":"{\"title\":\"A 16Mb dual-mode ReRAM macro with sub-14ns computing-in-memory and memory functions enabled by self-write termination scheme\",\"authors\":\"Wei-Hao Chen, W. Lin, Li-Ya Lai, Shuangchen Li, Chien-Hua Hsu, Huan-Ting Lin, Heng-Yuan Lee, Jian-Wei Su, Yuan Xie, S. Sheu, Meng-Fan Chang\",\"doi\":\"10.1109/IEDM.2017.8268468\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Recent ReRAM devices enable the development of computing-in-memory (CIM) for beyond von Neumann structure. However, wide distribution in ReRAM resistance (R) causes low yield for CIM operations. This work proposes a dual-mode computing (DMc) ReRAM macro structure with a dual-function voltage-mode self-write termination (DV-SWT) scheme to achieve both memory and fundamental CIM functions (AND, OR and XOR operations) with high yield. The DV-SWT increases the read margin for CIM operations by suppressing the R-variations caused by macro-level IR-drop and process variations. A 16Mb DMc-ReRAM full-function macro was fabricated using 1T1R HfO ReRAM devices and 0.15um CMOS process. The measured delay of the CIM operations is less than 14ns, which is 86+x faster than previous ReRAM-based CIM works. This work also represents the first CIM ReRAM macro with ReRAM device and CIM-peripheral circuits fully integrated on the same die.\",\"PeriodicalId\":412333,\"journal\":{\"name\":\"2017 IEEE International Electron Devices Meeting (IEDM)\",\"volume\":\"10 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"51\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2017 IEEE International Electron Devices Meeting (IEDM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEDM.2017.8268468\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 IEEE International Electron Devices Meeting (IEDM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2017.8268468","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A 16Mb dual-mode ReRAM macro with sub-14ns computing-in-memory and memory functions enabled by self-write termination scheme
Recent ReRAM devices enable the development of computing-in-memory (CIM) for beyond von Neumann structure. However, wide distribution in ReRAM resistance (R) causes low yield for CIM operations. This work proposes a dual-mode computing (DMc) ReRAM macro structure with a dual-function voltage-mode self-write termination (DV-SWT) scheme to achieve both memory and fundamental CIM functions (AND, OR and XOR operations) with high yield. The DV-SWT increases the read margin for CIM operations by suppressing the R-variations caused by macro-level IR-drop and process variations. A 16Mb DMc-ReRAM full-function macro was fabricated using 1T1R HfO ReRAM devices and 0.15um CMOS process. The measured delay of the CIM operations is less than 14ns, which is 86+x faster than previous ReRAM-based CIM works. This work also represents the first CIM ReRAM macro with ReRAM device and CIM-peripheral circuits fully integrated on the same die.