三维集成电路上多通硅孔(TSV)串扰建模:实验验证及其在法拉第笼设计中的应用

Yu-Jen Chang, Hao-Hsiang Chuang, Yi-Chang Lu, Y. Chiou, Tzong-Lin Wu, P. Chen, Shih-Hsien Wu, T. Kuo, C. Zhan, W. Lo
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引用次数: 23

摘要

本文提出了一种描述多tsv串扰强度的等效电路模型。在该模型中,模型中所有集总元素的值都用封闭公式给出。因此,构建多个tsv模型的计算量大大低于以往的工作。通过对9块堆叠硅片的测量和全波仿真结果验证了该方法的准确性。然后将该模型应用于串扰抑制设计。具有占地面积更小(成本更低)的优点,建议采用菱形接地的法拉第笼设计,与传统的法拉第笼概念相比,成本更低,性能相近。
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Novel crosstalk modeling for multiple through-silicon-vias (TSV) on 3-D IC: Experimental validation and application to Faraday cage design
An equivalent circuit model to characterize the crosstalk strength in multiple TSVs is newly proposed. In this model, all the values of lumped elements in the model are given in closed-form formulas. Therefore, the computation effort for constructing the model of multiple TSVs is much lower than other previous works. The accuracy is verified by the measurement for a nine stacked silicon chips and the full-wave simulation results. The proposed model is then utilized to the design for crosstalk mitigation. With the advantages of smaller occupied area (lower cost), a rhombus-grounded Faraday cage design is recommended with lower cost and similar performance compared to conventional Faraday cage concept.
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