基于结构测试的多芯片模块缺陷迁移

J. Eastman, W. Creighton, A. Laidler, Tak Lun Leung
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引用次数: 2

摘要

描述了在结构化测试环境中100个芯片mcm的大批量生产和返工,以及缺陷迁移(持续质量改进)的基本原理。这些mcm的制造和返工需要不断提高芯片质量。这需要在芯片、INICM和系统级别进行昂贵的诊断,以便确定缺陷的根本原因,并改进芯片制造、测试和老化过程。讨论了结构测试(检测滞留故障和延迟缺陷)、诊断自动化、系统级测试关联、系统级、MCM级和芯片级缺陷跟踪协调以及缺陷模型关联的要求和实现。mcm采用电平敏感扫描设计(LSSD)设计。通过结构测试及其相关诊断,将缺陷的详细信息提供给芯片制造商,从而成功地提高了芯片的质量水平。
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Defect Migration of Multi-chip Modules Using Structural Test
The high-volume production and rework of 100 chip MCMs in a structured test environment and the rationale for defect migration (continuous quality improvement) is described. Manufacturing and rework of these MCMs requires continuous improvements in chip quality. This necessitates in- expensive diagnostics at chip, INICM and system level so that the root cause of the defects can be determined and the chip fabrication, test, and burn-in processes improved. The requirements for and implementation of structural test (to detect both stuck fault and delay defects), diagnostic automation, system level test correlation, coordination of defect tracking at the system, MCM and chip level and defect model correlation are discussed. The MCMs are designed using level-sensitive scan design (LSSD). Through the use of structural test and it's associated diagnostics, the details of the defects are sup- plied to the chip fabricator who successfully improves the chip quality levels.
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