硅通孔传输延迟的解析模型

D. Khalil, Y. Ismail, M. Khellah, T. Karnik, V. De
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引用次数: 56

摘要

本文探讨了三维集成电路中硅通孔(tsv)传输延迟的建模方法。tsv的电特性和模型是实现三维集成电路分析和CAD的关键。本文提出了TSV的传播延迟随其物理尺寸的函数的解析模型。所提出的解析模型与利用电磁场求解器和损耗传输线电路模型进行的仿真结果吻合较好。与早期的互连模型相比,所提出的分析模型除了简单之外,还提供了更高的精度和保真度。因此,所提出的分析模型对于三维集成电路的分析是非常有用的。
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Analytical Model for the Propagation Delay of Through Silicon Vias
This paper explores the modeling of the propagation delay of through silicon vias (TSVs) in 3D integrated circuits. The electrical characteristics and models of the TSVs are very crucial in enabling the analysis and CAD in 3D integrated circuits. In this paper, an analytical model for the propagation delay of the TSV as a function of its physical dimensions is proposed. The presented analytical model is in great agreement with simulations using electromagnetic field solver and lossy transmission line circuit model. Compared to earlier interconnect models, the presented analytical model provides higher accuracy and fidelity in addition to its simplicity. Hence, the presented analytical model is very useful in the analysis of 3D integrated circuits.
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