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摘要

NMOS/NLDMOS LSS死区少数载流子隔离对于同步降压转换器产品的可靠性和模具尺寸成本至关重要。我们使用TCAD仿真评估了MAAP隔离环设计在1、10和100uA/um死区电流下的有效性。我们没有使用简单的二极管作为注入源,而是采用整体方法将LSS NMOS或NLDMOS包括在测试结构中。瞬态仿真结果表明,绝大部分电流由MOS通道传导,而非主体二极管。这是由NMOS和NLDMOS晶体管硅材料测量验证。由于实际体二极管电流和衬底电子注入水平较低,我们发现在隔离环区域上有很大的空间来实现高性能的少数载流子隔离和显着降低芯片尺寸成本。
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NMOS/NLDMOS LSS dead-time minority carrier isolation optimization
NMOS/NLDMOS LSS dead-time minority carrier isolation is critical for Synchronous Step-down converter products both for reliability and die size cost. We evaluate MAAP isolation ring design effectiveness using TCAD simulation with 1, 10 and 100uA/um dead-time currents. Instead of using a simple diode as injection source, we took a wholistic approach to include the LSS NMOS or NLDMOS in the test structures. Transient simulation results show that instead of body diode, MOS channels conduct most of the current. This is verified by NMOS and NLDMOS transistor silicon material measurements. With the low level of actual body diode current and substrate electron injection, we found there is a lot of room to achieve high performance minority carrier isolation and significant die size cost reduction on the isolation ring region at the same time.
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