利用光学衍射显微镜进行剖面表征

2006 Northern Optics Pub Date : 2006-06-14 DOI:10.1109/NO.2006.348369

P. Hansen, N. Agersnap, A. Kuhle, J. Garnaes, J. Petersen

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引用次数: 1

摘要

描述了光学衍射显微镜在光学剖面表征方面的最新进展。光栅轮廓由测量的衍射效率来表征。通过改变模型形貌并匹配计算和测量的衍射效率来确定表面形貌。模型参数包括高度、充填度和侧壁角度。在本工作中，该方法已应用于具有各种材料组成的光栅。研究了一系列周期为399nm ~ 1245nm的光栅。结果表明，光学衍射显微镜是一种简单、快速的获取光栅轮廓和光栅材料之间的材料边界的方法。结果与原子力显微镜测量结果吻合较好。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Profile characterization using optical diffraction microscopy

Recent developments In optical profile characterisation using optical diffraction microscopy are described. Grating profiles are characterized from the measured diffraction efficiencies. The surface topography Is found by varying model topography and matching the calculated and measured diffraction efficiencies. The model parameters Include height, filling degree and sidewall angles. In the present work the method has been applied to gratings having various material composition. A series of gratings with periods ranging from 399 nm to 1245 nm has been Investigated. It Is shown that optical diffraction microscopy Is a simple and fast method for retrieving grating profiles and the material boundary between the grating materials. The results show good agreement with atomic force microscope measurements.

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2006 Northern Optics

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