纳米形貌的扫描隧道显微镜测量

1988 Conference on Precision Electromagnetic Measurements Pub Date : 1988-06-07 DOI:10.1109/CPEM.1988.671326

Y. Kobayashi, S. Okayama, M. Komuro, M. Okano, S. Watanabe, A. Homma

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引用次数: 0

摘要

研制了两种不同类型的扫描隧道显微镜(STM)，用于测量纳米级三维形貌。利用电化学形成的尖端，在聚焦离子束光刻、光学光栅和光盘冲压机制备的Si衬底上获得了分辨率约为10 nm的精细网格图案地形图。

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Measurement of Nanometer Topography by Scanning Tunneling Microscope

Scanning tunneling microscopes (STM) of two different types were developed for measurement of nanometer order three-dimensional topography. Topographic maps of fine grid patterns on Si substrate fabricated by focused ion-beam lithography, optical grating and a compact disk stamper were obtained with resolution of around 10 nm by using electrochemically formed tips.

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1988 Conference on Precision Electromagnetic Measurements

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