MIS Ni/SiC二极管的表观肖特基势垒高度

I. R. Kaufmann, M. Pereira, H. Boudinov
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引用次数: 3

摘要

通过对金属-绝缘体-半导体Ni/SiC二极管的电流-电压曲线的模拟和测量,从理论上和实验上分析了肖特基势垒高度。考虑金属和半导体之间存在绝缘体层,利用热离子发射模型研究了SBH随温度的增加。本文描述了一种新的模拟方法,表明在不考虑绝缘层存在的情况下提取SBH会对具有金属绝缘体半导体结构的肖特基二极管产生误导。讨论了实际横波峰和视横波峰的区别。对测量温度升高时SBH明显增大的现象进行了解释。作为实例,该模型应用于制备的Ni/SiC肖特基结构。
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Apparent Schottky Barrier Height of MIS Ni/SiC diodes
Schottky Barrier Height (SBH) of Metal-Insulator-Semiconductor Ni/SiC diodes were theoretically and experimentally analysed through simulation/measurements of Current-Voltage curves. The SBH increase with the temperature was studied by Thermionic Emission Model, considering an insulator layer between metal and semiconductor. A new method of simulation is described, showing that extracting the SBH without taking into account the existence of the insulating layer, provides misleading results for Schottky diodes with Metal Insulator Semiconductor structure. The difference between real SBH and apparent SBH is discussed. An explanation for the SBH apparent increasing when the measuring temperature is increased is suggested. As an example the model is applied on fabricated Ni/SiC Schottky structures.
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