{"title":"用于射频应用的MUMPs过程中的非常宽调谐范围的微机电电容器","authors":"T. Tsang, M. El-Gamal","doi":"10.1109/VLSIC.2003.1221154","DOIUrl":null,"url":null,"abstract":"A structure that extends the tuning range of MEMS capacitors by at least a factor of eight, compared to recently reported devices fabricated in the same polysilicon surface micromachining MUMPs process, is proposed. A 0.2 pF capacitor has a 325% tuning range, and a Q-factor of 90 at 2.4 GHz. A variation of the same structure has a 0.6 pF capacitance and a 433% tuning range, compared to 238% and 253% for state-of-the-art MEMS and CMOS devices, respectively. The self-resonance frequencies of both devices are beyond 4 GHz.","PeriodicalId":270304,"journal":{"name":"2003 Symposium on VLSI Circuits. Digest of Technical Papers (IEEE Cat. No.03CH37408)","volume":"29 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-06-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"21","resultStr":"{\"title\":\"Very wide tuning range micro-electromechanical capacitors in the MUMPs process for RF applications\",\"authors\":\"T. Tsang, M. El-Gamal\",\"doi\":\"10.1109/VLSIC.2003.1221154\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A structure that extends the tuning range of MEMS capacitors by at least a factor of eight, compared to recently reported devices fabricated in the same polysilicon surface micromachining MUMPs process, is proposed. A 0.2 pF capacitor has a 325% tuning range, and a Q-factor of 90 at 2.4 GHz. A variation of the same structure has a 0.6 pF capacitance and a 433% tuning range, compared to 238% and 253% for state-of-the-art MEMS and CMOS devices, respectively. The self-resonance frequencies of both devices are beyond 4 GHz.\",\"PeriodicalId\":270304,\"journal\":{\"name\":\"2003 Symposium on VLSI Circuits. Digest of Technical Papers (IEEE Cat. No.03CH37408)\",\"volume\":\"29 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2003-06-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"21\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2003 Symposium on VLSI Circuits. Digest of Technical Papers (IEEE Cat. No.03CH37408)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/VLSIC.2003.1221154\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2003 Symposium on VLSI Circuits. Digest of Technical Papers (IEEE Cat. No.03CH37408)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIC.2003.1221154","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Very wide tuning range micro-electromechanical capacitors in the MUMPs process for RF applications
A structure that extends the tuning range of MEMS capacitors by at least a factor of eight, compared to recently reported devices fabricated in the same polysilicon surface micromachining MUMPs process, is proposed. A 0.2 pF capacitor has a 325% tuning range, and a Q-factor of 90 at 2.4 GHz. A variation of the same structure has a 0.6 pF capacitance and a 433% tuning range, compared to 238% and 253% for state-of-the-art MEMS and CMOS devices, respectively. The self-resonance frequencies of both devices are beyond 4 GHz.
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