氮化镓衬底上的高功率蓝紫色激光二极管

T. Mizuno, M. Takeya, S. Ikeda, T. Fujimoto, Y. Ohfuji, K. Oikawa, M. Taniguchi, H. Ichinokura, T. Hashizu, M. Ikeda
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引用次数: 0

摘要

我们在氮化镓衬底上制备了400纳米波段的高可靠性氮化镓基蓝紫色激光二极管(bv - ld)。在60/spl度/C的45 mW连续波(CW)下,这些ld稳定工作了1400小时以上。我们采用了1.4 /spl mu/m的窄脊宽,脊条纹的两侧在SiO/sub / 2/上覆盖了一层堆叠的Si。因此,我们成功地生产出了无扭结输出功率超过150mw的bv - ld。阈值电流为35.4 mA,温度为25/spl℃。在25/spl度/C的45 mW连续工作条件下,工作电流和电压分别为65.8 mW和4.66 V。它们的特性几乎超过了在ELO-GaN/蓝宝石上生长的bv - ld的最佳特性,表明可以在GaN衬底上生产适用于下一代蓝光光盘系统的实用bv - ld。
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High-power blue-violet laser diodes on GaN substrates
We have fabricated 400-nm-band GaN-based blue-violet laser diodes (BV-LDs) with high reliability on GaN substrates. Under 45 mW continuous wave (CW) operation at 60/spl deg/C, these LDs have been operating stably for more than 1400 h. We have adopted the narrow ridge width of 1.4 /spl mu/m and both sides of ridge stripe are covered with a stacked layer of Si on SiO/sub 2/. As a result, we have succeed in producing BV-LDs with a kink-free output power of more than 150 mW. The threshold current was 35.4 mA at 25/spl deg/C. The operating current and voltage were 65.8 mW and 4.66 V, respectively, under 45 mW CW operation at 25/spl deg/C. Their characteristics came close to surpassing the best characteristics of BV-LDs grown on ELO-GaN/sapphire, demonstrating that practical BV-LDs suitable for next-generation blu-ray disc system can be produced on GaN substrates.
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