Daohuan Feng, Yi Jiang, Yunsong Qiu, Yuhong Zheng, Harry Kim, Jaewoo Kim, Jian Chu, Guangsu Shao, Yucheng Liao, Cheng-Jer Yang, Minrui Hu, Wenli Zhao, Linjiang Xia, Jianfeng Xiao, Di Ma, Yuan Cheng, Xiangbo Kong, Chao Lin, Tianming Li, Yongjie Li, Jingheng Meng, K. Shao, Yan Wang, Xiaoan Yang, Xiang Liu, Qinghua Han, Huiming Li, Yanzhe Tang, Mingde Liu, Eric Wu, Xiaopeng Li, Renrui Huang, Mingtang Zhang, Long Hou, Xuan Pan, Xinwen Jin, Shuiping Zhao, D. Han, Ted C. Park, Deyuan Xiao, Chao Zhao, A. Yoo
{"title":"垂直通道晶体管(VCT)作为未来4F2 DRAM架构的接入晶体管","authors":"Daohuan Feng, Yi Jiang, Yunsong Qiu, Yuhong Zheng, Harry Kim, Jaewoo Kim, Jian Chu, Guangsu Shao, Yucheng Liao, Cheng-Jer Yang, Minrui Hu, Wenli Zhao, Linjiang Xia, Jianfeng Xiao, Di Ma, Yuan Cheng, Xiangbo Kong, Chao Lin, Tianming Li, Yongjie Li, Jingheng Meng, K. Shao, Yan Wang, Xiaoan Yang, Xiang Liu, Qinghua Han, Huiming Li, Yanzhe Tang, Mingde Liu, Eric Wu, Xiaopeng Li, Renrui Huang, Mingtang Zhang, Long Hou, Xuan Pan, Xinwen Jin, Shuiping Zhao, D. Han, Ted C. Park, Deyuan Xiao, Chao Zhao, A. Yoo","doi":"10.1109/IMW56887.2023.10145977","DOIUrl":null,"url":null,"abstract":"In this work, a novel 4F2 VCT (vertical channel transistor) targeting for next generation of DRAM is proposed. We approached process feasibility and device performance of $\\mathbf{4 F}^{2}$ VCT by TCAD simulation. Detailed processes such as BL (bit line) and WL (word line) loop have also been discussed to achieve lx node VCT DRAM. For the first time, silicon demonstration for $8\\mathrm{~Gb}$ full array VCT with density as high as $198\\ \\mathrm{Mbit}/\\mathrm{mm}^{2}$ is successfully realized. Besides, we also demonstrated standard switching behavior of VCT access transistor with reasonable device performance.","PeriodicalId":153429,"journal":{"name":"2023 IEEE International Memory Workshop (IMW)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Vertical Channel Transistor (VCT) as Access Transistor for Future 4F2 DRAM Architecture\",\"authors\":\"Daohuan Feng, Yi Jiang, Yunsong Qiu, Yuhong Zheng, Harry Kim, Jaewoo Kim, Jian Chu, Guangsu Shao, Yucheng Liao, Cheng-Jer Yang, Minrui Hu, Wenli Zhao, Linjiang Xia, Jianfeng Xiao, Di Ma, Yuan Cheng, Xiangbo Kong, Chao Lin, Tianming Li, Yongjie Li, Jingheng Meng, K. Shao, Yan Wang, Xiaoan Yang, Xiang Liu, Qinghua Han, Huiming Li, Yanzhe Tang, Mingde Liu, Eric Wu, Xiaopeng Li, Renrui Huang, Mingtang Zhang, Long Hou, Xuan Pan, Xinwen Jin, Shuiping Zhao, D. Han, Ted C. Park, Deyuan Xiao, Chao Zhao, A. Yoo\",\"doi\":\"10.1109/IMW56887.2023.10145977\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this work, a novel 4F2 VCT (vertical channel transistor) targeting for next generation of DRAM is proposed. We approached process feasibility and device performance of $\\\\mathbf{4 F}^{2}$ VCT by TCAD simulation. Detailed processes such as BL (bit line) and WL (word line) loop have also been discussed to achieve lx node VCT DRAM. For the first time, silicon demonstration for $8\\\\mathrm{~Gb}$ full array VCT with density as high as $198\\\\ \\\\mathrm{Mbit}/\\\\mathrm{mm}^{2}$ is successfully realized. Besides, we also demonstrated standard switching behavior of VCT access transistor with reasonable device performance.\",\"PeriodicalId\":153429,\"journal\":{\"name\":\"2023 IEEE International Memory Workshop (IMW)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2023 IEEE International Memory Workshop (IMW)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IMW56887.2023.10145977\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2023 IEEE International Memory Workshop (IMW)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMW56887.2023.10145977","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Vertical Channel Transistor (VCT) as Access Transistor for Future 4F2 DRAM Architecture
In this work, a novel 4F2 VCT (vertical channel transistor) targeting for next generation of DRAM is proposed. We approached process feasibility and device performance of $\mathbf{4 F}^{2}$ VCT by TCAD simulation. Detailed processes such as BL (bit line) and WL (word line) loop have also been discussed to achieve lx node VCT DRAM. For the first time, silicon demonstration for $8\mathrm{~Gb}$ full array VCT with density as high as $198\ \mathrm{Mbit}/\mathrm{mm}^{2}$ is successfully realized. Besides, we also demonstrated standard switching behavior of VCT access transistor with reasonable device performance.