{"title":"CIM模型","authors":"M. Aardal","doi":"10.1109/ASMC.1995.484358","DOIUrl":null,"url":null,"abstract":"What is CIM? What is the role of CIM in manufacturing? What is the value of CIM and how can it be measured? How much CIM do we need? How can the impact of CIM be communicated to manufacturing management? SEMATECH and its member companies have been wrestling with these questions for several years. Several programs have addressed these questions and, as a result, we are in a much better position to provide the answers. Leveraging the results of SEMATECH programs and other related works, this paper introduces a new \"model based\" approach to the challenge of comprehensively explaining CIM and its impact on manufacturing. This CIM model is being developed at SEMATECH and is entitled the CIM Evolution Model (CEM).","PeriodicalId":237741,"journal":{"name":"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop","volume":"45 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-11-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"A model of CIM\",\"authors\":\"M. Aardal\",\"doi\":\"10.1109/ASMC.1995.484358\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"What is CIM? What is the role of CIM in manufacturing? What is the value of CIM and how can it be measured? How much CIM do we need? How can the impact of CIM be communicated to manufacturing management? SEMATECH and its member companies have been wrestling with these questions for several years. Several programs have addressed these questions and, as a result, we are in a much better position to provide the answers. Leveraging the results of SEMATECH programs and other related works, this paper introduces a new \\\"model based\\\" approach to the challenge of comprehensively explaining CIM and its impact on manufacturing. This CIM model is being developed at SEMATECH and is entitled the CIM Evolution Model (CEM).\",\"PeriodicalId\":237741,\"journal\":{\"name\":\"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop\",\"volume\":\"45 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-11-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.1995.484358\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.1995.484358","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

摘要

什么是CIM?CIM在制造业中的作用是什么?CIM的价值是什么?如何测量它?我们需要多少CIM ?如何将CIM的影响传达给制造管理层?SEMATECH及其成员公司多年来一直在努力解决这些问题。有几个节目已经解决了这些问题,因此,我们处于一个更好的位置来提供答案。利用SEMATECH项目和其他相关工作的成果,本文介绍了一种新的“基于模型”的方法来全面解释CIM及其对制造业的影响。该CIM模型正在SEMATECH开发,并被称为CIM演进模型(CEM)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
A model of CIM
What is CIM? What is the role of CIM in manufacturing? What is the value of CIM and how can it be measured? How much CIM do we need? How can the impact of CIM be communicated to manufacturing management? SEMATECH and its member companies have been wrestling with these questions for several years. Several programs have addressed these questions and, as a result, we are in a much better position to provide the answers. Leveraging the results of SEMATECH programs and other related works, this paper introduces a new "model based" approach to the challenge of comprehensively explaining CIM and its impact on manufacturing. This CIM model is being developed at SEMATECH and is entitled the CIM Evolution Model (CEM).
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Automation and statistical process control of a single wafer etcher in a manufacturing environment Equipment management system (EMS) Reconvergent specular detection of material defects on silicon Managing multi-chamber tool productivity Advanced dielectric etching with a high density plasma tool: issues and challenges in manufacturing
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1