时效过程中铜碰撞键中Cu/Al金属间化合物的演化

Yaiiliong Tian, C. Hang, Chunqing Wang, Y. Zhou
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引用次数: 11

摘要

Cu/Al金属间化合物(IMCs)在铜键与Al金属化焊盘界面的生长会增加接触电阻,降低键的可靠性。在本研究中,热超声铜碰撞键在250℃下时效1 ~ 196小时。然后研究了Cu/Al IMCs的演化过程。利用光学显微镜对球键的xy平面截面进行观察,在Cu/Al界面上发现了3层不同颜色的IMC层。Cu/Al IMC的主要相为Cu9Al4和CuAl2。CuAl被认为是铜键中的另一个相。在时效过程中,Cu/Al IMC首先从键的外围生长,然后向内扩展到键的中心区域。此外,在IMC层和键底之间出现了一些空洞,从键的外围向中心区域发展。
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Evolution of Cu/Al Intermetallic Compounds in the Copper Bump bonds during Aging Process
Growth of Cu/Al intermetallic compounds (IMCs) at the interface between the copper bond and the Al metallization pad would increase the contact resistance and degrade the bond reliabilities. In this study, the thermosonic copper bump bonds were aged at 250degC for 1 to 196 hours. Then the evolution of Cu/Al IMCs was investigated. Three IMC layers with different colors were found at the Cu/Al interface using the optical microscopy on the xy plane cross-section of the ball bond. The main phases in the Cu/Al IMC are confirmed to be Cu9Al4, and CuAl2. CuAl is believed to be another phase in the copper bond. During the aging process, Cu/Al IMC grew from the periphery of the bond initially and propagated inward to the centre area later. Moreover, some cavities appeared between the IMC layer and bond bottom from the bond periphery and developed into the centre area.
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