非易失性存储器件用P(VDF-TrFE)共聚物薄膜集成硅有机铁电场效应晶体管的电学特性

Sang-Hyun Lim, A. Rastogi, S. Desu
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引用次数: 1

摘要

研究了基于Si-MOSFET集成铁电聚偏氟乙烯三氟共聚物(P(VDF-TrFE))作为栅极和SiO2缓冲层的非易失性存储器(NvRAM)结构的可行性。通道电流IDS测量显示,由于栅极通道上均匀的铁电场,通道电流没有饱和。通道电导的调制可归因于敏感的可切换极化场。在开/关操作下获得了显著的开关漏极电流比>105倍。利用记忆窗口表示了集成有机聚合物场效应管的极化场调节阈值电压。
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Electrical characteristics of organic ferroelectric FET integrated with Si using P(VDF-TrFE) copolymer films for nonvolatile memory devices
The feasibility of nonvolatile memory (NvRAM) structure with nondestructive readout (NDRO) capability based on Si-MOSFET integrated with a ferroelectric polyvinylidene fluoride trifluoroethylene copolymer (P(VDF-TrFE)) as a gate along with SiO2 buffer has been demonstrated. Measurement of channel current IDS shows no saturation due to uniform ferroelectric field across gate channel. Modulation of channel conductance is attributed to sensitively switchable polarization field. Remarkable switching drain current ratio of >105 times with ON/OFF operations were obtained. Memory window is obtained to show the polarization field regulating threshold voltages of the integrated organic polymer FET.
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