工业应用的新型高频线性离子源

S. Koh, W. Choi, Hyung-Jin Jung, G. Bougrov, E. Kralkina, S. Kondranin, V. Pavlov
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引用次数: 0

摘要

离子束技术的发展,如离子辅助薄膜沉积、材料表面改性等,特别是这些技术在工业上的应用,要求开发新一代离子源,以提供电流密度在0.05 ~ 1.5 mA/cm2范围内的惰性和化学反应气体的大尺寸离子束。为了给工业提供上述参数的器件,研制了新型HF线性离子源(HF LIS),提取的离子束尺寸为5x30cm2。HF LIS由气体放电室和利用静电加速原理提取离子的离子光学系统组成。HF - LIS中的离子束是从HF放电等离子体中提取出来的,该等离子体在HF - LIS气体放电室中点燃并持续放电。为了点燃和维持放电,高频功率由高频发生器通过匹配装置提供给位于气体放电室外表面的天线端。为了避免高频功率损失,气体放电室的壁由介电材料(玻璃、石英、玻璃陶瓷)制成。为了提高等离子体高频功率输入的效率,将气体放电室置于静态外磁场中,并根据静电体等离子体波激发条件选择感应值。磁场形状取自最佳电子约束条件。离子提取和离子束形成是通过由发射、加速和减速电极组成的静电离子光学系统来实现的。发射电极是相对于地的正电位下的部分离子透明壁。加速电极对离子也是部分透明的,并且相对于地面处于负电位下。减速电极接地。新型HF LIS的测试表明,在使用惰性或反应性工作气体时,离子源运行可靠,提取的离子束均匀性高。
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New HF Linear Ion Source For Industrial Applications
Development of ion beam technologies such as ion assisted deposition of thin films, surface modification of materials, and especially utilization of these technologies in industry, require the development of the new generation of the ion sources, which can provide large size ion beams of inert and chemically reactive gases with current density in the range 0.05 1.5 mA/cm2 . In order to provide industry by devices with mentioned parameters the new HF linear ion source (HF LIS) with the size of the extracted ion beam 5x30cm2 was developed. HF LIS consists of gas discharge chamber where the ionization of working gas takes place and ion optic system that utilizes the principle of electrostatic acceleration for ion extraction. The ion beam in HF LIS is extracted from plasma of HF discharge ignited and sustained in HF LIS gas discharge chamber. To ignite and sustain a discharge the HF power is supplied from a high-frequency generator via a matching device to the antenna ends positioned on the extemal surface of gas discharge chamber. To avoid HF power losses the walls of a gas-discharge chamber are made of dielectric (glass, quartz, glass ceramic). To increase the efficiency of highfrequency power input in plasma the gas discharge chamber is placed in a static extemal magnetic field which induction value is chosen from the condition of electrostatic volume plasma waves excitation. The magnetic field shape is taken from the best electron confinement condition. Ion extraction and ion beam formation runs by means of an electrostatic ion optic system consisting of the emitting, accelerating and decelerating electrodes. The emitting electrode is a partially ion-transparent wall under positive potential with respect to the ground. The accelerating electrode is also partially transparent for ions and is under negative potential with respect to the ground. The decelerating electrode is grounded. Tests of the new HF LIS showed reliable operation of the ion source while using inert or reactive working gases as well as high uniformity of the extracted ion beam.
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