M. Panicker, N. L. Greenman, J. Forster, P. Johnston
{"title":"低成本陶瓷薄膜球栅阵列","authors":"M. Panicker, N. L. Greenman, J. Forster, P. Johnston","doi":"10.1109/ECTC.1994.367656","DOIUrl":null,"url":null,"abstract":"Ball grid array (BGA) is emerging as the next significant surface-mount package. This paper describes a simply structured, cost-effective ceramic BGA substrate, which conforms to current JEDEC registrations for flip-chip connections, as an alternative to multilayer co-fired ceramic BGA's. The BGA, processed on VIA/PLANE, a ceramic wafer with hermetic, tungsten-copper vias, uses a thin-film deposition technique, Enhanced Ion Plating (EIP). Controlled-Collapse Chip Connection (C4), solder-bumped flip chips are typically full or partial arrays of 5 mil solder bumps on 10 mil centers. This BGA transforms the C4 density to 35 mil bumps on 50 mil centers, much more compatible with current surface-mount assembly practices. The use of VIA/PLANE maintains the time-proven reliability of C4 on ceramic, and the flatness characteristics of VIA/PLANE eminently complement C4 and BGA technologies.<<ETX>>","PeriodicalId":344532,"journal":{"name":"1994 Proceedings. 44th Electronic Components and Technology Conference","volume":"290 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1994-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Low-cost ceramic thin-film ball grid arrays\",\"authors\":\"M. Panicker, N. L. Greenman, J. Forster, P. Johnston\",\"doi\":\"10.1109/ECTC.1994.367656\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Ball grid array (BGA) is emerging as the next significant surface-mount package. This paper describes a simply structured, cost-effective ceramic BGA substrate, which conforms to current JEDEC registrations for flip-chip connections, as an alternative to multilayer co-fired ceramic BGA's. The BGA, processed on VIA/PLANE, a ceramic wafer with hermetic, tungsten-copper vias, uses a thin-film deposition technique, Enhanced Ion Plating (EIP). Controlled-Collapse Chip Connection (C4), solder-bumped flip chips are typically full or partial arrays of 5 mil solder bumps on 10 mil centers. This BGA transforms the C4 density to 35 mil bumps on 50 mil centers, much more compatible with current surface-mount assembly practices. The use of VIA/PLANE maintains the time-proven reliability of C4 on ceramic, and the flatness characteristics of VIA/PLANE eminently complement C4 and BGA technologies.<<ETX>>\",\"PeriodicalId\":344532,\"journal\":{\"name\":\"1994 Proceedings. 44th Electronic Components and Technology Conference\",\"volume\":\"290 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1994-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1994 Proceedings. 44th Electronic Components and Technology Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ECTC.1994.367656\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1994 Proceedings. 44th Electronic Components and Technology Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ECTC.1994.367656","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Ball grid array (BGA) is emerging as the next significant surface-mount package. This paper describes a simply structured, cost-effective ceramic BGA substrate, which conforms to current JEDEC registrations for flip-chip connections, as an alternative to multilayer co-fired ceramic BGA's. The BGA, processed on VIA/PLANE, a ceramic wafer with hermetic, tungsten-copper vias, uses a thin-film deposition technique, Enhanced Ion Plating (EIP). Controlled-Collapse Chip Connection (C4), solder-bumped flip chips are typically full or partial arrays of 5 mil solder bumps on 10 mil centers. This BGA transforms the C4 density to 35 mil bumps on 50 mil centers, much more compatible with current surface-mount assembly practices. The use of VIA/PLANE maintains the time-proven reliability of C4 on ceramic, and the flatness characteristics of VIA/PLANE eminently complement C4 and BGA technologies.<>