小几何双极晶体管的周长效应

W. Lee, J. Sun, J. Warnock, K. Jenkins
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引用次数: 2

摘要

研究了几何效应对器件性能的基本限制。给出了广泛的三维器件仿真研究结果,并与0.25 μ m双极技术的实验结果进行了比较。本研究表明,对于较小的器件,在低电流密度下,几何因素本身可以导致较低的直流电流增益和较低的f/sub T/。在高电流密度下,周长效应对小型发射极器件是有利的。对于像BiCMOS栅极这样的大电流工作,这是一个特别重要的设计考虑因素。
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Perimeter effects in small geometry bipolar transistors
The fundamental limits on device performance imposed by geometrical effects are studied. Results of an extensive three-dimensional (3D) device simulation study are given and compared with experimental results of a 0.25- mu m bipolar technology. It is shown in this study that geometrical factors alone can result in lower DC current gain and lower f/sub T/ at low current densities for smaller devices. It is also shown that perimeter effects are beneficial for small emitter devices at high current densities. This is a particularly important design consideration for high current operation as in BiCMOS gates.<>
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