{"title":"小几何双极晶体管的周长效应","authors":"W. Lee, J. Sun, J. Warnock, K. Jenkins","doi":"10.1109/VLSIT.1992.200644","DOIUrl":null,"url":null,"abstract":"The fundamental limits on device performance imposed by geometrical effects are studied. Results of an extensive three-dimensional (3D) device simulation study are given and compared with experimental results of a 0.25- mu m bipolar technology. It is shown in this study that geometrical factors alone can result in lower DC current gain and lower f/sub T/ at low current densities for smaller devices. It is also shown that perimeter effects are beneficial for small emitter devices at high current densities. This is a particularly important design consideration for high current operation as in BiCMOS gates.<<ETX>>","PeriodicalId":404756,"journal":{"name":"1992 Symposium on VLSI Technology Digest of Technical Papers","volume":"41 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1992-06-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Perimeter effects in small geometry bipolar transistors\",\"authors\":\"W. Lee, J. Sun, J. Warnock, K. Jenkins\",\"doi\":\"10.1109/VLSIT.1992.200644\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The fundamental limits on device performance imposed by geometrical effects are studied. Results of an extensive three-dimensional (3D) device simulation study are given and compared with experimental results of a 0.25- mu m bipolar technology. It is shown in this study that geometrical factors alone can result in lower DC current gain and lower f/sub T/ at low current densities for smaller devices. It is also shown that perimeter effects are beneficial for small emitter devices at high current densities. This is a particularly important design consideration for high current operation as in BiCMOS gates.<<ETX>>\",\"PeriodicalId\":404756,\"journal\":{\"name\":\"1992 Symposium on VLSI Technology Digest of Technical Papers\",\"volume\":\"41 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1992-06-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1992 Symposium on VLSI Technology Digest of Technical Papers\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/VLSIT.1992.200644\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1992 Symposium on VLSI Technology Digest of Technical Papers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.1992.200644","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Perimeter effects in small geometry bipolar transistors
The fundamental limits on device performance imposed by geometrical effects are studied. Results of an extensive three-dimensional (3D) device simulation study are given and compared with experimental results of a 0.25- mu m bipolar technology. It is shown in this study that geometrical factors alone can result in lower DC current gain and lower f/sub T/ at low current densities for smaller devices. It is also shown that perimeter effects are beneficial for small emitter devices at high current densities. This is a particularly important design consideration for high current operation as in BiCMOS gates.<>