{"title":"LDMOSFET有效沟道长度的提取及其在建模中的应用","authors":"K. Tsuji, K. Terada, M. Minami, K. Tanaka","doi":"10.1109/ICMTS.2000.844409","DOIUrl":null,"url":null,"abstract":"The effective channel length of LD (lateral double diffused) MOSFET is accurately extracted and is applied to develop its circuit simulation model, which has the physical meaning of the channel length and so on. This model is consisted of a simple MOSFET, gate-voltage dependent resistor and three resistors. It is confirmed that the errors between the measured electrical characteristics and the calculated ones are less than 5 percent.","PeriodicalId":447680,"journal":{"name":"ICMTS 2000. Proceedings of the 2000 International Conference on Microelectronic Test Structures (Cat. No.00CH37095)","volume":"22 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-03-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Extraction of effective LDMOSFET channel length and its application to the modeling\",\"authors\":\"K. Tsuji, K. Terada, M. Minami, K. Tanaka\",\"doi\":\"10.1109/ICMTS.2000.844409\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The effective channel length of LD (lateral double diffused) MOSFET is accurately extracted and is applied to develop its circuit simulation model, which has the physical meaning of the channel length and so on. This model is consisted of a simple MOSFET, gate-voltage dependent resistor and three resistors. It is confirmed that the errors between the measured electrical characteristics and the calculated ones are less than 5 percent.\",\"PeriodicalId\":447680,\"journal\":{\"name\":\"ICMTS 2000. Proceedings of the 2000 International Conference on Microelectronic Test Structures (Cat. No.00CH37095)\",\"volume\":\"22 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-03-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ICMTS 2000. Proceedings of the 2000 International Conference on Microelectronic Test Structures (Cat. No.00CH37095)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICMTS.2000.844409\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ICMTS 2000. Proceedings of the 2000 International Conference on Microelectronic Test Structures (Cat. No.00CH37095)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMTS.2000.844409","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Extraction of effective LDMOSFET channel length and its application to the modeling
The effective channel length of LD (lateral double diffused) MOSFET is accurately extracted and is applied to develop its circuit simulation model, which has the physical meaning of the channel length and so on. This model is consisted of a simple MOSFET, gate-voltage dependent resistor and three resistors. It is confirmed that the errors between the measured electrical characteristics and the calculated ones are less than 5 percent.
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