III-V型氮化hfet的速度超调效应和传输时间:蒙特卡罗研究

M. Singh, Yuh‐Renn Wu, J. Singh
{"title":"III-V型氮化hfet的速度超调效应和传输时间:蒙特卡罗研究","authors":"M. Singh, Yuh‐Renn Wu, J. Singh","doi":"10.1109/DRC.2004.1367828","DOIUrl":null,"url":null,"abstract":"Monte Carlo simulation of AlGaN/GaN HEMTs were carried out and compared with GaAs based devices. The following outcomes of our simulations are noteworthy: i) partially due to the relatively heavy electron effective mass in GaN, the velocities of the electrons are mostly below the steady state values through most of the channel; ii) unlike what is observed in GaAs based short channel devices, there is no pronounced overshoot effect, even at high drain source biases, due to increased scattering; iii) our simulations show that the suppression of overshoot is directly related to the length of the high field region. This length is quite small for usual bias conditions. We suggest that a non-uniform composition of the barrier region could conceivably help in spreading out the high field region, which is present at the drain end of the device. Other results of the Monte Carlo simulation include transconductance, noise information and unity current gain frequency.","PeriodicalId":385948,"journal":{"name":"Conference Digest [Includes 'Late News Papers' volume] Device Research Conference, 2004. 62nd DRC.","volume":"21 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-06-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Velocity overshoot effects and transit times in III-V nitride HFETs : a Monte Carlo study\",\"authors\":\"M. Singh, Yuh‐Renn Wu, J. Singh\",\"doi\":\"10.1109/DRC.2004.1367828\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Monte Carlo simulation of AlGaN/GaN HEMTs were carried out and compared with GaAs based devices. The following outcomes of our simulations are noteworthy: i) partially due to the relatively heavy electron effective mass in GaN, the velocities of the electrons are mostly below the steady state values through most of the channel; ii) unlike what is observed in GaAs based short channel devices, there is no pronounced overshoot effect, even at high drain source biases, due to increased scattering; iii) our simulations show that the suppression of overshoot is directly related to the length of the high field region. This length is quite small for usual bias conditions. We suggest that a non-uniform composition of the barrier region could conceivably help in spreading out the high field region, which is present at the drain end of the device. Other results of the Monte Carlo simulation include transconductance, noise information and unity current gain frequency.\",\"PeriodicalId\":385948,\"journal\":{\"name\":\"Conference Digest [Includes 'Late News Papers' volume] Device Research Conference, 2004. 62nd DRC.\",\"volume\":\"21 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2004-06-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Conference Digest [Includes 'Late News Papers' volume] Device Research Conference, 2004. 62nd DRC.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DRC.2004.1367828\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference Digest [Includes 'Late News Papers' volume] Device Research Conference, 2004. 62nd DRC.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.2004.1367828","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

对AlGaN/GaN hemt进行了蒙特卡罗模拟,并与基于GaAs的器件进行了比较。我们的模拟结果值得注意:1)部分由于氮化镓中相对较重的电子有效质量,电子通过大部分通道的速度大多低于稳态值;ii)与在基于砷化镓的短通道器件中观察到的不同,由于散射增加,即使在高漏源偏置下,也没有明显的超调效应;Iii)我们的模拟表明,超调的抑制与高场区域的长度直接相关。这个长度对于通常的偏置条件是相当小的。我们建议,非均匀组成的势垒区域可能有助于扩散高场区域,这是存在于器件的漏极。蒙特卡罗仿真的其他结果包括跨导、噪声信息和单位电流增益频率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Velocity overshoot effects and transit times in III-V nitride HFETs : a Monte Carlo study
Monte Carlo simulation of AlGaN/GaN HEMTs were carried out and compared with GaAs based devices. The following outcomes of our simulations are noteworthy: i) partially due to the relatively heavy electron effective mass in GaN, the velocities of the electrons are mostly below the steady state values through most of the channel; ii) unlike what is observed in GaAs based short channel devices, there is no pronounced overshoot effect, even at high drain source biases, due to increased scattering; iii) our simulations show that the suppression of overshoot is directly related to the length of the high field region. This length is quite small for usual bias conditions. We suggest that a non-uniform composition of the barrier region could conceivably help in spreading out the high field region, which is present at the drain end of the device. Other results of the Monte Carlo simulation include transconductance, noise information and unity current gain frequency.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Complex band structure-based non-equilibrium Green's function (NEGF) transport studies for ultra-scaled carbon nanotube (CNT) transistors [CNTFETs] Nano-scale MOSFETs with programmable virtual source/drain High power AlGaN/GaN heterojunction FETs for base station applications Physical limits on binary logic switch scaling Directly lithographic top contacts for pentacene organic thin-film transistors
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1