基于$\text{VO}_{2}$的横向/纵向器件和超低热预算弛豫振荡器的实验演示

A. P., Y. Chauhan, Amit Verma
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引用次数: 0

摘要

二氧化钒(V02)由于其固有的金属相变绝缘体特性,已被用于陡峭的亚阈值斜坡开关、神经形态计算的耦合振荡器和RRAM的选择器。V02的薄膜合成需要高温工艺或较长的退火时间,这增加了热预算,并且难以与后端线CMOS技术工艺集成。在这项工作中,我们使用低热预算工艺来制造和表征水平和垂直V02器件。在这两种配置中,V02器件显示超过阈值电压的电压感应可逆开关。器件的阈值电压作为器件通道长度减小的函数而单调减小。由于通道长度明显更小,垂直器件与水平结构相比显示出最低的阈值电压。最后,我们展示了一个使用V02器件的松弛振荡器,振荡频率为1.75 kHz,振荡周期超过50万次。我们还演示了在~1.3-2 kHz范围内的电压控制调谐振荡频率。这种具有低热预算工艺的V02器件的演示将有助于将基于V02的相变器件与CMOS技术集成
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Experimental Demonstration of $\text{VO}_{2}$ based Lateral/Vertical Devices and Relaxation Oscillator with an Ultra-low Thermal Budget Process
Vanadium dioxide (V02) has been exploited in steep subthreshold slope switches, coupled oscillators for neuromorphic computing, and selectors for RRAM due to its intrinsic insulator to metal phase transition properties. The thin-film synthesis of V02 needs a high-temperature process or long annealing duration, which increases the thermal budget and is difficult to integrate with the back-end of line CMOS technology process. In this work, we use a low thermal budget process to fabricate and characterize both horizontal and vertical V02 devices. In both configurations, V02 devices show voltage induced reversible switching beyond a threshold voltage. The threshold voltage of devices decreases monotonically as a function of decreasing channel length of the devices. The vertical device shows the lowest threshold voltage compared to the horizontal structure due to significantly smaller channel length. Finally, we demonstrate a relaxation oscillator using the fabricated V02 devices which shows stable oscillations over half a million cycles with an oscillation frequency of 1.75 kHz. We also demonstrate voltage-controlled tuning of the oscillation frequency in the range of ~1.3-2 kHz. This demonstration of V02 devices with a low-thermal budget process will be helpful for integrating V02-based phase transition devices with CMOS technology
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