{"title":"准弹道输运区漂移扩散模型的蒙特卡罗参数定标","authors":"Lei Shen, S. Di, L. Yin, Xiaoyan Liu, G. Du","doi":"10.23919/SNW.2017.8242303","DOIUrl":null,"url":null,"abstract":"As the device scaling down to sub-10nm, the quasi-ballistic transport becomes important. Some previous works have suggested using DD method to involve the quasi-ballistic transport effect through modifying the transport parameters. A procedure is introduced to calibrate the transport parameters of the DD model by using the simulation results of MC device simulator.","PeriodicalId":424135,"journal":{"name":"2017 Silicon Nanoelectronics Workshop (SNW)","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Parameter calibration of drift-diffusion model in quasi-ballisitc transport region with Monte Carlo method\",\"authors\":\"Lei Shen, S. Di, L. Yin, Xiaoyan Liu, G. Du\",\"doi\":\"10.23919/SNW.2017.8242303\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"As the device scaling down to sub-10nm, the quasi-ballistic transport becomes important. Some previous works have suggested using DD method to involve the quasi-ballistic transport effect through modifying the transport parameters. A procedure is introduced to calibrate the transport parameters of the DD model by using the simulation results of MC device simulator.\",\"PeriodicalId\":424135,\"journal\":{\"name\":\"2017 Silicon Nanoelectronics Workshop (SNW)\",\"volume\":\"6 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-06-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2017 Silicon Nanoelectronics Workshop (SNW)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.23919/SNW.2017.8242303\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 Silicon Nanoelectronics Workshop (SNW)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/SNW.2017.8242303","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Parameter calibration of drift-diffusion model in quasi-ballisitc transport region with Monte Carlo method
As the device scaling down to sub-10nm, the quasi-ballistic transport becomes important. Some previous works have suggested using DD method to involve the quasi-ballistic transport effect through modifying the transport parameters. A procedure is introduced to calibrate the transport parameters of the DD model by using the simulation results of MC device simulator.